在快速转向镜中用于增强线性度和高扭矩的混合磁阻致动器拓扑

IF 3.7 2区 工程技术 Q2 ENGINEERING, MANUFACTURING
Alexander Pechhacker, Christoph Palka, Ernst Csencsics, Georg Schitter
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引用次数: 0

摘要

本文提出了一种倾斜混合磁阻执行器(HRAs)的拓扑结构,该拓扑结构在保持高扭矩输出的同时提高了线性度。确定了非线性行为的主要来源,并利用磁等效电路模型建立了新的执行器拓扑结构的设计要求。有限元仿真表明,与现有的执行器相比,所提出的设计实现了更高的线性度和更高的转矩电流比。为了验证,设计并实现了一个由HRA拓扑驱动的±1°范围的快速转向镜。实验结果证实,与现有的HRAs相比,扭矩电流比和刚度的变化减少了三分之一,扭矩电流比增加了76%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hybrid reluctance actuator topology for enhanced linearity and high torque in fast steering mirrors
This paper presents a topology for tilting hybrid reluctance actuators (HRAs) that improves linearity while maintaining high torque output. The primary source of non-linear behavior is identified, and design requirements for the new actuator topology are established using a magnetic equivalent circuit model. Finite element method simulations demonstrate that the proposed design achieves greater linearity and a higher torque to current ratio compared to state of the art actuators. For validation, a fast steering mirror, actuated by the proposed HRA topology, with a ±1° range is designed and implemented. Experimental results confirm a threefold reduction in the variation of the torque to current ratio and stiffness, along with a 76% increase in the torque to current ratio compared to the state of the art HRAs.
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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