低温下光谱发射率测量的高精度温度标定方法

IF 3.4 3区物理与天体物理 Q2 INSTRUMENTS & INSTRUMENTATION

Infrared Physics & Technology Pub Date : 2025-08-28 DOI:10.1016/j.infrared.2025.106119

Zeye Yuan , Longfei Li , Kun Yu , Yufang Liu

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引用次数: 0

摘要

在低温条件下，辐射源测温的不确定度给弱辐射检测带来不可忽略的系统误差。本文提出了一种新的等效温度定标方法，该方法基于非探测区域的温度测量，迭代确定中心辐射区的温度。建立了样品辐射源的比例传热模型，模拟了高真空低温条件下的表面温度分布，优化了温度迭代范围。采用温度波动理论定量分析了辐射源温度不确定性对直接发射率测量精度的影响。通过对不同温度条件下铜基高发射率涂层样品测温结果的对比分析，系统地评价了所提出的温度计算方法的准确性。利用vo2 -蓝宝石样品进一步验证了实验装置的可靠性，在213-363 K的温度范围内进行了光谱发射率测量，总体扩展测量不确定度优于0.01。

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High-precision temperature calibration method for spectral emissivity measurement at low temperatures

Under low-temperature conditions, temperature measurement uncertainties of radiation sources introduce non-negligible systematic errors in weak radiation detection. This study proposes a novel equivalent temperature calibration method that iteratively determines the temperature of the central radiation zone based on temperature measurements in non-detection areas. A proportional heat transfer model of the sample radiation source is developed to simulate the surface temperature distribution under high-vacuum cryogenic conditions, optimizing the temperature iteration range. Temperature fluctuation theory is incorporated to quantitatively analyze the impact of radiation source temperature uncertainties on direct emissivity measurement accuracy. The accuracy of the proposed temperature calculation method is systematically evaluated through a comparative analysis of temperature measurement results for copper-based high-emissivity coating samples across various temperature conditions. The reliability of the experimental setup is further validated using a VO₂-sapphire sample, demonstrating spectral emissivity measurements within the temperature range of 213–363 K, with an overall expanded measurement uncertainty better than 0.01.

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来源期刊

Infrared Physics & Technology 物理-光学

CiteScore

5.70

自引率

12.10%

发文量

400

审稿时长

67 days

期刊介绍： The Journal covers the entire field of infrared physics and technology: theory, experiment, application, devices and instrumentation. Infrared'' is defined as covering the near, mid and far infrared (terahertz) regions from 0.75um (750nm) to 1mm (300GHz.) Submissions in the 300GHz to 100GHz region may be accepted at the editors discretion if their content is relevant to shorter wavelengths. Submissions must be primarily concerned with and directly relevant to this spectral region. Its core topics can be summarized as the generation, propagation and detection, of infrared radiation; the associated optics, materials and devices; and its use in all fields of science, industry, engineering and medicine. Infrared techniques occur in many different fields, notably spectroscopy and interferometry; material characterization and processing; atmospheric physics, astronomy and space research. Scientific aspects include lasers, quantum optics, quantum electronics, image processing and semiconductor physics. Some important applications are medical diagnostics and treatment, industrial inspection and environmental monitoring.