半导体中的光热动态波:具有两种温度、静水应力和电导率效应的双相位滞后模型

IF 2.5 3区 工程技术 Q2 MECHANICS
Alwaleed Kamel, Manar. Rabea, Kh. Lotfy, Amr M. S. Mahdy, E. S. Elidy
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引用次数: 0

摘要

采用双相滞后(DPL)模型和Lord-Shulman (LS)理论,结合单一松弛时间,分析了静流体初始应力对介质的影响。本文将介绍一种利用双温度因子的新模型,以改进光热理论。本研究分析了导热性和导电性变化的影响。我们研究了一维无限延伸半导体材料暴露表面的热载荷现象。该介质还受到等离子体波和光热过程中产生的机械力的影响。所讨论的变量的精确值是用拉普拉斯变换(LT)方法得到的。此外,用解析法得到了两个温度系数值。场量在物理域中以数值结果的形式显示,并以视觉方式表示,以说明不同特性(如导电性)的影响。结果比较了有和没有两个温度分量,以及流体静力启动应力的两个不同值。比较了用DPL模型和LS理论计算得到的广义热弹性计算变量。这种比较是在没有和存在电导率参数的情况下进行的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photothermal dynamic waves in semiconductors: a dual-phase-lag model with two temperature, hydrostatic stress, and electrical conductivity effects

The dual-phase-lag (DPL) model and Lord–Shulman (LS) theories, incorporating a single relaxation time, are utilized to analyze the impact of hydrostatic initial stress on a medium. A novel model will be introduced, utilizing two-temperature factors, to improve the photothermal theory. This study analyzes the effects of changing thermal and electrical conductivity. We examined the phenomenon of thermal loading on the exposed surface of an indefinitely extending semiconducting material in one dimension. This medium was also affected by plasma waves and the mechanical force generated during a photothermal process. The exact values of the variables in question are obtained using the Laplace transform (LT) approach. Furthermore, the two values of temperature coefficients were obtained by analytical methods. The field quantities are exhibited as numerical results in the physical domain and visually represented to illustrate the influence of distinct characteristics, such as electrical conductivity. The findings are compared with and without two-temperature components, as well as for two distinct values of the hydrostatic starting stress. A comparison is made between the computed variables obtained from generalized thermoelasticity using the DPL model and the LS theory. This comparison is performed in the absence and presence of the electrical conductivity parameter.

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来源期刊
CiteScore
4.40
自引率
10.70%
发文量
234
审稿时长
4-8 weeks
期刊介绍: Archive of Applied Mechanics serves as a platform to communicate original research of scholarly value in all branches of theoretical and applied mechanics, i.e., in solid and fluid mechanics, dynamics and vibrations. It focuses on continuum mechanics in general, structural mechanics, biomechanics, micro- and nano-mechanics as well as hydrodynamics. In particular, the following topics are emphasised: thermodynamics of materials, material modeling, multi-physics, mechanical properties of materials, homogenisation, phase transitions, fracture and damage mechanics, vibration, wave propagation experimental mechanics as well as machine learning techniques in the context of applied mechanics.
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