用于真空紫外检测的氮化铝微带光电探测器:高选择性,快速响应和热稳定性

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zelong Fan , Wenliang Li , Luyang Wei , Baikui Li , Zhenhua Sun , Honglei Wu
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引用次数: 0

摘要

真空紫外(VUV)光电探测器在空间探索、高能物理和生物传感等领域的应用是必不可少的。然而,传统器件通常依赖于复杂的光学滤波器、高工作电压和笨重的配置,这限制了它们的集成和可扩展性。本文采用物理气相输运(PVT)方法合成了具有ab平面取向生长的高质量氮化铝(AlN)单晶微带,并将其用于制备金属-半导体-金属(MSM)光导探测器。该装置具有出色的VUV选择性,抑制比(R185/R310)为1293。在185 nm照明下,它提供了超过1000的光暗电流比(PDCR)。时间响应测量结果表明,器件的上升时间为170 ns,衰减时间为53 μs,具有良好的动态性能。此外,该设备在高达150°C的温度下保持稳定运行,证实了其出色的热稳健性。这项工作显示了pvt生长的AlN微带作为紧凑,高性能和无滤波器的VUV光电探测器的有前途的材料平台的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Aluminum nitride micro ribbons photodetector for vacuum ultraviolet detection: High selectivity, fast response and thermal robustness
Vacuum ultraviolet (VUV) photodetectors are essential for applications in space exploration, high-energy physics, and biological sensing. However, conventional devices typically rely on complex optical filters, high operating voltages, and bulky configurations, which limit their integration and scalability. In this work, high-quality aluminum nitride (AlN) single-crystalline micro ribbons with ab-plane-oriented growth were synthesized using the physical vapor transport (PVT) method and utilized to fabricate metal–semiconductor–metal (MSM) photoconductive detector. The device demonstrates outstanding VUV selectivity, with a rejection ratio (R185/R310) of 1293. Under 185 nm illumination, it delivers a photo-to-dark current ratio (PDCR) exceeding 1000. Temporal response measurements reveal a rise time of 170 ns and a decay time of 53 μs, indicating excellent dynamic performance. Furthermore, the device maintains stable operation at temperatures up to 150 °C, confirming its excellent thermal robustness. This work shows the potential of PVT-grown AlN micro ribbons as a promising material platform for compact, high-performance, and filter-free VUV photodetectors.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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