反向同轴二极管直流辉光放电的局部分析

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-08-27 DOI:10.1016/j.vacuum.2025.114654

L. Córdova-Castillo , I. Camps , A. Figueroa , S. Cuevas

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引用次数: 0

摘要

本文对低温直流辉光放电在同轴圆柱体环区进行了理论和实验研究。等离子体密度可以通过改变施加电压和中性气体压力来改变。利用Langmuir探针技术沿径向重建了离子密度、平均电子能和等离子体势分布。本文给出了低温等离子体的一维渐近解，该解考虑了文献中大多数解析解所忽略的非线性效应和非恒定电子温度。此外，还建立了高阶谱数值解。分析和数值结果与实验结果定性一致。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Local analysis of a DC glow discharge in an inverted coaxial diode

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Local analysis of a DC glow discharge in an inverted coaxial diode

A theoretical and experimental study of a low-temperature DC glow discharge in the annular region of coaxial cylinders is presented. Plasma density was modified by varying the applied voltage and the neutral gas pressure. The ion density, mean electron energy, and plasma potential profiles were reconstructed through local measurements with the Langmuir probe technique along the radial direction. A one-dimensional asymptotic solution of a low-temperature plasma is presented that considers nonlinear effects and non-constant electronic temperature, which are neglected in most analytical solutions found in the literature. Additionally, a high-order spectral numerical solution was developed. Both analytical and numerical results agree qualitatively with the experimental observations.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.