通过调整硼掺杂层的厚度来增强表面掺硼金刚石薄膜的二次电子发射特性

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-08-25 DOI:10.1016/j.vacuum.2025.114694

Yunrong Wang, Qiang Wei, Zhangcong Xia, Jie Li, Shengli Wu

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引用次数: 0

摘要

采用微波等离子体化学气相沉积（MPCVD）法制备了掺硼金刚石薄膜。系统研究了掺杂层厚度对晶体质量、表面形貌和二次电子发射特性的影响。结果表明，表面掺杂硼层的膜的晶粒尺寸比未掺杂硼层的膜的晶粒尺寸大，但随着表面掺杂硼层厚度的增加，膜的晶粒尺寸变化最小。x射线衍射分析表明，制备的金刚石膜取向为（111）和（220），表明制备的金刚石膜为多晶结构。二次电子发射系数随硼掺杂层厚度的增加而增大，在一次电子能为200eV时，当硼掺杂层厚度为0.75 μm时，二次电子发射系数达到最大值6.2。

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Enhanced secondary electron emission characteristics of surface boron-doped diamond films by adjusting the thickness of boron-doping layer

Boron-doped diamond films were prepared by microwave plasma chemical vapor deposition (MPCVD). The influence of doping layer thickness on crystal quality, surface morphology and secondary electron emission (SEE) characteristics were systematically investigated. The results reveal that the grain size of the film with surface boron-doped layer is larger than that of the film without such a layer, however, the grain size of the film exhibits minimal variation with the increase of the thickness of surface the boron-doped layer. X-ray diffraction analysis shows that the prepared orientation of diamond films is (111) and (220), indicating that the prepared films are polycrystalline structure. Furthermore, the secondary electron emission coefficient of the film increases with the increase of the thickness of the boron-doping layer and reaches a maximum value of 6.2 at primary electron energy of 200eV for a thickness of 0.75 μm compared to others.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.