Rapid direct growth of large–area graphene on quartz via LPCVD for ultrasonic sensing

The direct and rapid growth of graphene on insulating substrates holds immense significance for various applications, such as optoelectronics and sensors. Here, we report the low–pressure chemical vapor deposition (LPCVD) growth of large–area, high–quality graphene on quartz using isopropanol as carbon source. The technique facilitates the rapid deposition of graphene onto transparent quartz substrates, thereby favouring their application in optoelectronic devices. The deposition time for a monolayer graphene film covering the substrate surface is approximately one minute. The prepared graphene films exhibit exceptional surface uniformity, high light transmission and polarization–depedent absorption properties. Moreover, the polarisation absorption properties of graphene have been utilized in sensitive ultrasonic detection. Ultrasonic waves induce changes in the refractive index of the liquid medium, leading to disturbances in the polarisation state and reflected light power from the liquid–quartz interface. This work offers a simple method for large–area graphene growth, explores its use in ultrasonic detection, and will advances graphene’s application in cutting–edge technologies.