n-IGZO/p-Si异质结构的光电导率

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
You Jin Kim, Ki-Jeong Lee, Munho Kim
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引用次数: 0

摘要

在这项研究中,我们提出了一种铟镓氧化锌(IGZO)突触装置,它模拟了人类大脑的功能,如学习、记忆和遗忘,具有类似于人类视觉感知和记忆过程的能力。该器件由在Si衬底上溅射的IGZO和互指Au电极构成,通过设计Si衬底的导电性,展示了长期记忆性能。优化后的硅衬底电阻率提高了长期持久的光导电性,实现了长达9天的记忆保留,与同类系统中通常观察到的几分钟到几小时的保留相比,这是一个显着的改进。在氮气气氛中300°C的热退火有效地使记忆被遗忘。使用x射线光电子能谱和tau图的详细分析揭示了氧空位和能带排列在这种记忆和遗忘行为中的作用的关键见解。IGZO突触器件独特的光记忆特性和可调性能突出了其在神经形态计算和先进光记忆存储系统中的应用潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Long-Term Persistent Photoconductivity in n-IGZO/p-Si Heterostructure for Photomemory Application.

In this study, we present an indium gallium zinc oxide (IGZO) synaptic device that emulates human brain functions such as learning, memorizing, and forgetting, with capabilities similar to those of human visual perception and memory processes. The device, constructed with IGZO sputtered on a Si substrate and interdigitated Au electrodes, demonstrates long-term memory performance through engineering the Si substrate's conductivity. Optimized Si substrate resistivity enhances long-term persistent photoconductivity, achieving memory retention for up to 9 days, a dramatic improvement over the retention of minutes to hours typically observed in similar systems. Thermal annealing at 300 °C in a nitrogen atmosphere effectively causes the memory to be forgotten. Detailed analysis using X-ray photoelectron spectroscopy and Tauc plots reveals critical insights into the role of oxygen vacancies and band alignment in this memory and forgetting behavior. The IGZO synaptic device's unique photomemory properties and tunable performance highlight its potential for applications in neuromorphic computing and advanced photomemory storage systems.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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