化学浴沉积法制备cuo基薄膜的可见光探测性能研究沉积时间和退火工艺的影响

IF 4 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Sophia Naghdi-Jirkol, Hosein Eshghi
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引用次数: 0

摘要

为了研究cuo基薄膜在456nm波长下的光探测性能,我们通过化学浴沉积(CBD)方法在玻璃衬底上合成了生长层,持续时间分别为10、15和20分钟,随后在300°C的Ar气氛中退火1小时,最终配置为金属-半导体-金属(MSM)结构。我们使用各种技术检查了这些层,包括场发射扫描电子显微镜(FESEM), x射线衍射(XRD),紫外-可见-近红外(UV-Vis-NIR)光谱,塞贝克效应,以及在黑暗和照明条件下的电流-电压(I-V)和电流-时间(I-t)测量。研究结果表明:(1)长大后的样品呈现单一的单斜CuO相,退火后的样品呈现二次立方Cu2O相;(2)光谱结果表明,各层均表现出较高的可见光吸收;(3)塞贝克效应分析证实各层均具有p型电导率;(4)暗I-V测量表明,退火层具有欧姆特性,电阻范围为1.6 ~ 16 MΩ;在光照下,I-t测量结果表明,生长时间最长的退火样品具有最高的光敏性(28%)和回收率(88%)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An investigation on the visible photodetection properties of CuO-based thin films synthesized by the chemical bath deposition (CBD) method; the influence of deposition time and the annealing process

To investigate the photodetection properties of CuO-based thin films at a wavelength of 456 nm, we synthesized the as-grown layers on glass substrates via the chemical bath deposition (CBD) method for durations of 10, 15, and 20 min, subsequently annealed at 300 °C in an Ar atmosphere for 1 h, and ultimately configured in metal-semiconductor-metal (MSM) structures. We examined the layers using various techniques, including field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), ultraviolet-visible-near infrared (UV-Vis-NIR) spectroscopy, the Seebeck effect, and current-voltage (I-V) and current-time (I-t) measurements under both dark and illuminated conditions. Our findings indicate: (1) the as-grown samples exhibited a singular monoclinic CuO phase, while annealing introduced a secondary cubic Cu2O phase; (2) the optical spectra reveal that all layers demonstrate high absorption in the visible spectrum; (3) analysis of the Seebeck effect confirms that all layers possess p-type conductivity; (4) dark I-V measurements show that the annealed layers exhibit an ohmic characteristic with electrical resistance ranging from 1.6 to 16 MΩ; and under light illumination, I-t measurements indicate that the annealed sample with the longest growth duration displays the highest photosensitivity (28%) and recovery percentage (88%).

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来源期刊
Optical and Quantum Electronics
Optical and Quantum Electronics 工程技术-工程:电子与电气
CiteScore
4.60
自引率
20.00%
发文量
810
审稿时长
3.8 months
期刊介绍: Optical and Quantum Electronics provides an international forum for the publication of original research papers, tutorial reviews and letters in such fields as optical physics, optical engineering and optoelectronics. Special issues are published on topics of current interest. Optical and Quantum Electronics is published monthly. It is concerned with the technology and physics of optical systems, components and devices, i.e., with topics such as: optical fibres; semiconductor lasers and LEDs; light detection and imaging devices; nanophotonics; photonic integration and optoelectronic integrated circuits; silicon photonics; displays; optical communications from devices to systems; materials for photonics (e.g. semiconductors, glasses, graphene); the physics and simulation of optical devices and systems; nanotechnologies in photonics (including engineered nano-structures such as photonic crystals, sub-wavelength photonic structures, metamaterials, and plasmonics); advanced quantum and optoelectronic applications (e.g. quantum computing, memory and communications, quantum sensing and quantum dots); photonic sensors and bio-sensors; Terahertz phenomena; non-linear optics and ultrafast phenomena; green photonics.
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