1-羟基苯并三唑缓蚀剂在铜表面超粗化中的应用及其显著提高铜-树脂结合强度的微观机理

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Yongqi Yuan, Yong Shen
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引用次数: 0

摘要

本研究将1-羟基苯并三唑(BTAOH)作为缓蚀剂引入到印刷电路板(PCB)表面粗化过程中,提高了铜基材与环氧树脂之间的界面粘附强度。采用喷雾法和真空热压法制备了铜-树脂复合材料。通过剥离试验对界面粘附强度的增强进行了评价。先进的表征技术,包括扫描电子显微镜(SEM)、原子力显微镜(AFM)、电子背散射衍射(EBSD)、聚焦离子束(FIB)和能量色散光谱(EDS),用于阐明提高附着力的微观结构机制。采用动电位极化和电化学阻抗谱(EIS)验证了BTAOH在酸性铜离子溶液中的缓蚀性能,并探讨了BTAOH诱导铜表面粗化的机理。量子化学计算进一步揭示了BTAOH的缓蚀机理。结果表明,缓蚀剂显著降低了腐蚀溶液的腐蚀速率。BTAOH的存在通过形成选择性吸附的表面结构来增强铜与树脂之间的界面粘附强度。这些结果表明,BTAOH在超粗化过程中可以作为有效的缓蚀剂,同时显著提高铜-树脂界面的粘附性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Application of 1-hydroxybenzotriazole as a corrosion inhibitor in the super roughening of copper surfaces and its microscopic mechanism for significantly enhancing copper-resin adhesion strength

Application of 1-hydroxybenzotriazole as a corrosion inhibitor in the super roughening of copper surfaces and its microscopic mechanism for significantly enhancing copper-resin adhesion strength

This study introduces 1-hydroxybenzotriazole (BTAOH) as a corrosion inhibitor in the surface roughening process of printed circuit board (PCB) manufacturing, which enhances the interfacial adhesion strength between copper substrates and epoxy resins. Copper-resin composites were prepared using the spray method and vacuum hot pressing. The enhancement of interfacial adhesion strength was evaluated through peel testing. Advanced characterization techniques, including scanning electron microscopy (SEM), atomic force microscopy (AFM), electron backscatter diffraction (EBSD), focused ion beam (FIB), and energy-dispersive spectroscopy (EDS), were used to elucidate the microstructural mechanisms underlying the improved adhesion. Potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) were employed to validate the corrosion inhibition performance of BTAOH in acidic copper ion solutions and to discuss the mechanism by which BTAOH induces surface roughening of copper. Quantum chemical calculations further revealed the corrosion inhibition mechanism of BTAOH. Results demonstrated that the corrosion inhibitor significantly reduced the corrosion rate of the etching solution. The presence of BTAOH significantly enhanced interfacial adhesion strength between copper and resin by forming a selectively adsorbed surface structure that promotes adhesion. These findings suggest that BTAOH serves as an effective corrosion inhibitor during super-roughening processes while substantially improving copper-resin interfacial adhesion performance.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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