用鲁棒高灵敏度光学角度传感器测量衍射尺度光栅节距偏差的验证

IF 3.7 2区 工程技术 Q2 ENGINEERING, MANUFACTURING
Tomoki Kitazume, Naoya Tashiro, Yuya Yamazaki, Yuki Shimizu
{"title":"用鲁棒高灵敏度光学角度传感器测量衍射尺度光栅节距偏差的验证","authors":"Tomoki Kitazume,&nbsp;Naoya Tashiro,&nbsp;Yuya Yamazaki,&nbsp;Yuki Shimizu","doi":"10.1016/j.precisioneng.2025.08.003","DOIUrl":null,"url":null,"abstract":"<div><div>A method for evaluating the pitch deviation of a diffraction scale grating based on the changes in the angles of diffraction of diffracted beams is a promising one for measurement of the pitch deviation over the entire length of the scale. In this method, differential operations with the readouts from two laser autocollimation (LA) units are performed so that the influences of the angular error motion of the scale scanning and the scale local slope can be reduced. Meanwhile, the sensitivity of each LA unit should be accurately calibrated, since the influence of the sensitivity fluctuation will become apparent, especially under the condition where the nominal grating pitch is much larger with respect to the light wavelength of the laser beam for measurement. Also, the verification of the pitch deviation obtained by the proposed method remains an issue to be addressed. In this paper, at first, the allowable sensitivity fluctuation of the LA unit is estimated based on numerical calculations. After that, by using the prototype optical system, the sensitivity fluctuations of LA units are evaluated in experiments. Furthermore, the pitch deviation of a diffraction scale grating with a nominal pitch of 4 μm is evaluated by the proposed method, and the accumulated pitch deviation is compared with the calibration curve provided by a scale manufacturer, as well as the calibration result obtained by a home-made calibration system with a laser interferometer.</div></div>","PeriodicalId":54589,"journal":{"name":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","volume":"96 ","pages":"Pages 874-883"},"PeriodicalIF":3.7000,"publicationDate":"2025-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Validation of pitch deviation measurement of a diffraction scale grating using robust and highly-sensitive optical angle sensors\",\"authors\":\"Tomoki Kitazume,&nbsp;Naoya Tashiro,&nbsp;Yuya Yamazaki,&nbsp;Yuki Shimizu\",\"doi\":\"10.1016/j.precisioneng.2025.08.003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>A method for evaluating the pitch deviation of a diffraction scale grating based on the changes in the angles of diffraction of diffracted beams is a promising one for measurement of the pitch deviation over the entire length of the scale. In this method, differential operations with the readouts from two laser autocollimation (LA) units are performed so that the influences of the angular error motion of the scale scanning and the scale local slope can be reduced. Meanwhile, the sensitivity of each LA unit should be accurately calibrated, since the influence of the sensitivity fluctuation will become apparent, especially under the condition where the nominal grating pitch is much larger with respect to the light wavelength of the laser beam for measurement. Also, the verification of the pitch deviation obtained by the proposed method remains an issue to be addressed. In this paper, at first, the allowable sensitivity fluctuation of the LA unit is estimated based on numerical calculations. After that, by using the prototype optical system, the sensitivity fluctuations of LA units are evaluated in experiments. Furthermore, the pitch deviation of a diffraction scale grating with a nominal pitch of 4 μm is evaluated by the proposed method, and the accumulated pitch deviation is compared with the calibration curve provided by a scale manufacturer, as well as the calibration result obtained by a home-made calibration system with a laser interferometer.</div></div>\",\"PeriodicalId\":54589,\"journal\":{\"name\":\"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology\",\"volume\":\"96 \",\"pages\":\"Pages 874-883\"},\"PeriodicalIF\":3.7000,\"publicationDate\":\"2025-08-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0141635925002417\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, MANUFACTURING\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0141635925002417","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0

摘要

根据衍射光束的衍射角变化来评价衍射尺度光栅的节距偏差是一种很有前途的测量整个尺度上节距偏差的方法。该方法利用两个激光自准直(LA)单元的读数进行微分运算,以减小尺度扫描的角误差运动和尺度局部斜率的影响。同时,每个LA单元的灵敏度需要精确校准,因为灵敏度波动的影响会变得明显,特别是在标称光栅间距相对于待测激光束的光波长大得多的情况下。此外,通过所提出的方法获得的俯仰偏差的验证仍然是一个有待解决的问题。本文首先在数值计算的基础上估计了LA单元的允许灵敏度波动。然后,利用原型光学系统,在实验中评估了喇光单元的灵敏度波动。利用该方法对标称节距为4 μm的衍射标度光栅的节距偏差进行了测量,并将累积的节距偏差与标度厂商提供的标定曲线以及自制激光干涉仪标定系统的标定结果进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Validation of pitch deviation measurement of a diffraction scale grating using robust and highly-sensitive optical angle sensors
A method for evaluating the pitch deviation of a diffraction scale grating based on the changes in the angles of diffraction of diffracted beams is a promising one for measurement of the pitch deviation over the entire length of the scale. In this method, differential operations with the readouts from two laser autocollimation (LA) units are performed so that the influences of the angular error motion of the scale scanning and the scale local slope can be reduced. Meanwhile, the sensitivity of each LA unit should be accurately calibrated, since the influence of the sensitivity fluctuation will become apparent, especially under the condition where the nominal grating pitch is much larger with respect to the light wavelength of the laser beam for measurement. Also, the verification of the pitch deviation obtained by the proposed method remains an issue to be addressed. In this paper, at first, the allowable sensitivity fluctuation of the LA unit is estimated based on numerical calculations. After that, by using the prototype optical system, the sensitivity fluctuations of LA units are evaluated in experiments. Furthermore, the pitch deviation of a diffraction scale grating with a nominal pitch of 4 μm is evaluated by the proposed method, and the accumulated pitch deviation is compared with the calibration curve provided by a scale manufacturer, as well as the calibration result obtained by a home-made calibration system with a laser interferometer.
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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