先进的AlN/SiO2/AlN多层涂层，用于保护金色装饰表面：提高硬度和颜色稳定性

IF 3.1 4区物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Current Applied Physics Pub Date : 2025-08-19 DOI:10.1016/j.cap.2025.08.009

Sitanan Raengroeng , Nattharika Theekhasuk , Aparporn Sakulkalavek , Rachsak Sakdanuphab , Nuttakrit Somdock

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引用次数: 0

摘要

本研究探讨了多层AlN/SiO2/AlN薄膜涂层的发展，以提高装饰用镀金银基材的抗失光泽性、表面硬度和颜色稳定性。通过电镀镀金膜，然后用反应磁控溅射镀多层膜。在保持固定AlN层的情况下，系统地改变SiO2的厚度。使用CIE Lab参数进行的光学评估证实，具有110 min SiO2层的试样具有可接受的色差（ΔE < 5）。x射线光电子能谱（XPS）显示稳定的Al-N和Si-O键，氧化最小。纳米压痕测试显示硬度显著提高，达到7.02±0.62 GPa。与未涂覆和电化学涂覆的样品不同，经过240天的环境暴露后，多层涂覆的样品没有明显的变色或硫诱导的降解。这些结果证实，AlN/SiO2/AlN多层膜有效地提高了类金表面的耐久性和美观稳定性，为长期装饰应用提供了一个有前途的解决方案。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Advanced AlN/SiO2/AlN multilayer coatings for protecting gold-like decorative surfaces: Improved hardness and color stability

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Advanced AlN/SiO2/AlN multilayer coatings for protecting gold-like decorative surfaces: Improved hardness and color stability

This study explores the development of multilayer AlN/SiO₂/AlN thin film coatings to enhance tarnish resistance, surface hardness, and color stability of gold-coated silver substrates for decorative use. Gold films were deposited via electroplating, followed by multilayer coatings using reactive magnetron sputtering. The SiO₂ thickness was systematically varied while maintaining fixed AlN layers. Optical evaluations using CIE Lab parameters confirmed that the specimen with a 110-min SiO₂ layer exhibited acceptable color difference (ΔE < 5). X-ray photoelectron spectroscopy (XPS) revealed stable Al–N and Si–O bonds with minimal oxidation. Nanoindentation tests showed a significant hardness increase, reaching 7.02 ± 0.62 GPa. After 240 days of ambient exposure, multilayer-coated samples showed no visible discoloration or sulfur-induced degradation, unlike uncoated and electrochemically coated samples. These results confirm that AlN/SiO₂/AlN multilayers effectively improve the durability and aesthetic stability of gold-like surfaces, offering a promising solution for long-term decorative applications.

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来源期刊

Current Applied Physics 物理-材料科学：综合

CiteScore

4.80

自引率

0.00%

发文量

213

审稿时长

33 days

期刊介绍： Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications. Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques. Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals. Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review. The Journal is owned by the Korean Physical Society.