电压通电纳米尖操纵生长独立钨纳米线

Kaisei Suzuki, Mizuki Ohashi, Hiroki Yoshizawa, Tokushi Kizuka
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引用次数: 0

摘要

原位透射电子显微镜显示,钨纳米尖端与W板接触,并在电压通电下进行拉伸操作,可以生长出独立的高纵横比W纳米线。直接观察了生长过程的结构动力学,同时在材料力学测量的基础上对其力学响应进行了研究。在0.9 ~ 2.5 v的直流电压下,纳米针尖与极板之间的W个纳米触点以1 ~ 9 nm/s的拉伸速度拉长。在靠近触点的正偏置电极表面,直径约为10nm的区域成为一个生长点,该区域的原子聚集形成并拉长纳米线。生长的纳米线的最大宽度和长度分别达到20 nm和189 nm。在生长过程中,得到的应变-应力关系呈锯齿状变化,表明纳米线的生长速度取决于作用在纳米线上的应力。目前的纳米线生长是基于电压激发引起的原子聚集导致的线端膨胀以及拉伸操作导致的生长抑制应力的降低。当脉冲电压激活和拉伸操作交替进行时,纳米线继续生长。在此条件下,最大导线宽度和长度分别增加到38 nm和294 nm。采用这种生长方法制备的高熔点金属的独立高纵横比纳米线有望应用于下一代高密度三维封装的纳米级互连。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth of free-standing tungsten nanowires via voltage-energization nanotip-manipulation
In situ transmission electron microscopy demonstrated that the contact of a tungsten (W) nanotip with a W plate and subsequent tensile manipulation under electric voltage energization resulted in the growth of free-standing high-aspect-ratio W nanowires. The structural dynamics of the growth process was directly observed, and simultaneously the mechanical response was investigated on the basis of material-mechanics measurements. W nanocontacts between nanotip and plate elongated at a tensile speed of 1–9 nm/s under direct-current voltages of 0.9–2.5V. An approximately 10 nm diameter region at a positively biased electrode surface adjacent to the contact became a growth point, and atoms in the region aggregated to form and elongate a nanowire. The maximum width and length of the grown nanowires reached 20 nm and 189 nm, respectively. Saw-edge shape variations were observed in strain-stress relations derived during the growth process, exhibiting that the growth speed of the nanowires depended on stress acting on the nanowires. The present nanowire growth occurred based on the expansion of the wire end due to the atom aggregation promoted by voltage energization with the reduction of growth-suppressing stresses by tensile manipulation. When pulse voltage energization and tensile manipulation were performed alternatively, nanowires growth continued. In this condition, the maximum wire width and length increased to 38 nm and 294 nm, respectively. The free-standing high-aspect-ratio nanowires of the high-melting-point metal derived by the present growth method is expected to apply them to nanometer scale interconnections in next-generation high density three-dimensional packaging.
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