Growth Behaviors of InAs/GaAs Quantum Dots Using Metal–Organic Chemical Vapor Deposition with Dual-Channel AsH3 Supply and H2 Carrier Gas Flow Rate Variation

In this study, we conducted a comprehensive investigation into the effects of a dual-channel arsine (AsH₃) supply and varying hydrogen (H₂) carrier gas flow rates on the growth of InAs/GaAs quantum dots (QDs) via metal–organic vapor deposition (MOCVD). The implementation of a dual-channel AsH₃ supply resulted in more stable and uniform QD growth compared with the conventional single-channel configuration, primarily due to the abrupt change in the V/III ratio. Moreover, the H₂ flow rate was found to play a critical role in determining the QD size distribution and optical performance. Notably, at a moderate H₂ flow rate of 100 sccm, enhanced QD size uniformity and increased photoluminescence (PL) intensity were observed. These findings provide valuable insights into achieving high-quality InAs/GaAs QDs through precise control of the AsH₃ supply configuration and H₂ carrier gas flow during the MOCVD growth process.