Dong Jin Shin , Junseop Lim , Jae-Min Kim , Jun Yeob Lee
{"title":"高永久偶极矩敏化剂是高效磷敏化荧光系统中末端掺杂反电荷捕获的关键","authors":"Dong Jin Shin , Junseop Lim , Jae-Min Kim , Jun Yeob Lee","doi":"10.1016/j.mattod.2025.06.038","DOIUrl":null,"url":null,"abstract":"<div><div><span><span>To design a highly efficient phosphor-sensitized fluorescence (PSF) system, it is crucial to suppress hole trap formation in the terminal dopant<span>. However, strategies to suppress hole trap formation in terminal dopants have not been fully explored. In this study, we propose an approach to improve the overall performance of PSF devices by addressing charge trapping in the terminal dopant using high-permanent </span></span>dipole moment<span> (PDM) phosphorescent sensitizers. Through the cascade modulation of high PDM and trap energy, the trapped charges in the terminal dopant were significantly suppressed. The phosphorescent sensitizer with high PDM and shallow highest occupied molecular orbital (HOMO) energy levels exhibited the highest trap suppression capability. The enhanced trap suppression capability resulted in a 391% improvement in the external quantum efficiency and a threefold increase in the device lifetime compared to a TBRB-only device. Finally, we present a guideline for selecting phosphorescent sensitizers with high trap suppression capability based on the combined influence of PDM and trap energy levels via </span></span>impedance spectroscopy. This framework provides valuable insights into the development of advanced PSF systems.</div></div>","PeriodicalId":387,"journal":{"name":"Materials Today","volume":"88 ","pages":"Pages 293-301"},"PeriodicalIF":22.0000,"publicationDate":"2025-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High-permanent dipole moment sensitizers as key to anticharge trapping of terminal dopant in highly efficient phosphor-sensitized fluorescence systems\",\"authors\":\"Dong Jin Shin , Junseop Lim , Jae-Min Kim , Jun Yeob Lee\",\"doi\":\"10.1016/j.mattod.2025.06.038\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div><span><span>To design a highly efficient phosphor-sensitized fluorescence (PSF) system, it is crucial to suppress hole trap formation in the terminal dopant<span>. However, strategies to suppress hole trap formation in terminal dopants have not been fully explored. In this study, we propose an approach to improve the overall performance of PSF devices by addressing charge trapping in the terminal dopant using high-permanent </span></span>dipole moment<span> (PDM) phosphorescent sensitizers. Through the cascade modulation of high PDM and trap energy, the trapped charges in the terminal dopant were significantly suppressed. The phosphorescent sensitizer with high PDM and shallow highest occupied molecular orbital (HOMO) energy levels exhibited the highest trap suppression capability. The enhanced trap suppression capability resulted in a 391% improvement in the external quantum efficiency and a threefold increase in the device lifetime compared to a TBRB-only device. Finally, we present a guideline for selecting phosphorescent sensitizers with high trap suppression capability based on the combined influence of PDM and trap energy levels via </span></span>impedance spectroscopy. This framework provides valuable insights into the development of advanced PSF systems.</div></div>\",\"PeriodicalId\":387,\"journal\":{\"name\":\"Materials Today\",\"volume\":\"88 \",\"pages\":\"Pages 293-301\"},\"PeriodicalIF\":22.0000,\"publicationDate\":\"2025-07-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Today\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369702125002809\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Today","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369702125002809","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
High-permanent dipole moment sensitizers as key to anticharge trapping of terminal dopant in highly efficient phosphor-sensitized fluorescence systems
To design a highly efficient phosphor-sensitized fluorescence (PSF) system, it is crucial to suppress hole trap formation in the terminal dopant. However, strategies to suppress hole trap formation in terminal dopants have not been fully explored. In this study, we propose an approach to improve the overall performance of PSF devices by addressing charge trapping in the terminal dopant using high-permanent dipole moment (PDM) phosphorescent sensitizers. Through the cascade modulation of high PDM and trap energy, the trapped charges in the terminal dopant were significantly suppressed. The phosphorescent sensitizer with high PDM and shallow highest occupied molecular orbital (HOMO) energy levels exhibited the highest trap suppression capability. The enhanced trap suppression capability resulted in a 391% improvement in the external quantum efficiency and a threefold increase in the device lifetime compared to a TBRB-only device. Finally, we present a guideline for selecting phosphorescent sensitizers with high trap suppression capability based on the combined influence of PDM and trap energy levels via impedance spectroscopy. This framework provides valuable insights into the development of advanced PSF systems.
期刊介绍:
Materials Today is the leading journal in the Materials Today family, focusing on the latest and most impactful work in the materials science community. With a reputation for excellence in news and reviews, the journal has now expanded its coverage to include original research and aims to be at the forefront of the field.
We welcome comprehensive articles, short communications, and review articles from established leaders in the rapidly evolving fields of materials science and related disciplines. We strive to provide authors with rigorous peer review, fast publication, and maximum exposure for their work. While we only accept the most significant manuscripts, our speedy evaluation process ensures that there are no unnecessary publication delays.