David G. Refaldi , Gerardo Malavena , Luca Colombo , Luca Chiavarone , Aurelio G. Mauri , Alessandro S. Spinelli , Christian Monzio Compagnoni
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Turnaround in the temperature dependence of RTN in 3D nand arrays entering the cryogenic regime
In this letter, we report clear experimental evidence of the existence of a turnaround in the temperature dependence of RTN in 3D nand Flash memories, showing up when entering the cryogenic regime. The origin of this phenomenology is traced back to the change of the dominant transport mechanism through the grain boundaries of the polysilicon channel of the memory cells, from thermionic emission to quantum-mechanical tunneling. This change decreases the impact of the charging/discharging of microscopic defects at the grain boundaries on cell current, making RTN in the cryogenic regime much more bearable than what expected from the extrapolation of room temperature data.
期刊介绍:
Microelectronic Engineering is the premier nanoprocessing, and nanotechnology journal focusing on fabrication of electronic, photonic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, photonics, energy, life sciences, and environment. It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics / photonics and micro-/nano-/bio-systems. Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.