金属和双金属表面吸附去除PH3、Cd和Pb的研究

IF 3.9 3区 工程技术 Q2 ENGINEERING, CHEMICAL
Dwijraj Mhatre,  and , Divesh Bhatia*, 
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引用次数: 0

摘要

DFT计算和机器学习(ML)模型用于研究有毒气相污染物PH3, Cd和Pb的吸附,并预测新的吸附剂组成。Ir, Pd, Pt, Rh和Ru强烈结合这些污染物,使它们适合同时去除。PH2离解对Ir、Pd、Rh和Ru具有速率决定作用,而PH3离解成PH2和H对Cu和Au具有速率决定作用。相对于Ag、Au和Cu, Rh、Pt、Pd和Ru对PH3解离的激活势垒较低。偏析和形成能计算支持在PH3解离和Cd/Pb吸附后表面合金的形成。研究了一种新型的Ag/Au/Cu与Ir/Pd/Pt/Rh/Ru复合的双金属吸附剂,用于去除痕量污染物。ML模型,包括额外树和随机森林回归,利用物理、电子和几何性质预测双金属表面的污染物吸附能,并通过额外树回归识别关键描述符。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Adsorptive Removal of PH3, Cd, and Pb on Metals and Bimetallic Surfaces

Adsorptive Removal of PH3, Cd, and Pb on Metals and Bimetallic Surfaces

DFT calculations and machine learning (ML) models are used to study the adsorption of toxic gas-phase contaminants PH3, Cd, and Pb and predict novel adsorbent compositions. Ir, Pd, Pt, Rh, and Ru strongly bind these contaminants, making them suitable for simultaneous removal. PH2 dissociation is rate-determining on Ir, Pd, Rh, and Ru, while dissociation of PH3 to PH2 and H is rate-determining on Cu and Au. The activation barriers for PH3 dissociation are lower on Rh, Pt, Pd, and Ru as compared to those on Ag, Au, and Cu. Segregation and formation energy calculations support the formation of surface alloys after the PH3 dissociation and Cd/Pb adsorption. Novel bimetallic adsorbents combining Ag/Au/Cu with Ir/Pd/Pt/Rh/Ru are identified for trace contaminant removal. ML models, including extra tree and random forest regression, predict contaminant adsorption energies on bimetallic surfaces using physical, electronic, and geometric properties, with key descriptors identified by extra tree regression.

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来源期刊
Industrial & Engineering Chemistry Research
Industrial & Engineering Chemistry Research 工程技术-工程:化工
CiteScore
7.40
自引率
7.10%
发文量
1467
审稿时长
2.8 months
期刊介绍: ndustrial & Engineering Chemistry, with variations in title and format, has been published since 1909 by the American Chemical Society. Industrial & Engineering Chemistry Research is a weekly publication that reports industrial and academic research in the broad fields of applied chemistry and chemical engineering with special focus on fundamentals, processes, and products.
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