交换偏置双层结构的各向异性和可控非局部阻尼。

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Mei Du, Zhe Li*, Chunmei Wang, Yanchen Luo, Rongpei Shi, Chris Van Haesendonck*, Qinghai Song* and Haoliang Liu*, 
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引用次数: 0

摘要

反铁磁(AFM)/铁磁(FM)界面的物理特性,包括交换偏置(EB)和自旋电流,是自旋电子学研究的重点。然而,电子束效应与自旋电流之间的关系仍存在争议。在这里,我们观察到一个典型的EB体系,即Co/CoO双层中各向异性和可控的非局部阻尼。在原位氧化CoO顶层的Co膜斜向沉积产生可控的单轴磁各向异性(UMA),并导致平均界面无补偿AFM自旋取向的可重构。在硬轴上的Gilbert阻尼常数大于易轴上的Gilbert阻尼常数,由于平均无补偿AFM自旋的重新定向,训练效应可以进一步增强该阻尼常数。我们的工作提供了EB对非局部阻尼的影响,并为AFM自旋电子器件的自旋电流控制开辟了一条新的途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Anisotropic and Controllable Nonlocal Damping in Exchange Bias Bilayers

Anisotropic and Controllable Nonlocal Damping in Exchange Bias Bilayers

The physics at antiferromagnetic (AFM)/ferromagnetic (FM) interfaces, including exchange bias (EB) and spin current, are of key interest in spintronics. However, the relationship between the EB effect and spin current is still controversial. Here, we have observed anisotropic and controllable nonlocal damping in a typical EB system, i.e., Co/CoO bilayers. Oblique deposition of Co film with an in situ oxidized CoO top layer generates a controllable uniaxial magnetic anisotropy (UMA), and leads to reconfigurable orientations of the average interfacial uncompensated AFM spins. The Gilbert damping constant is larger in the hard axis than in the easy axis of UMA, which can be further enhanced by the training effect because of the reorientation of the average uncompensated AFM spins. Our work provides insight into the effect of EB on nonlocal damping and paves a new way to control the spin current in AFM spintronic devices.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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