Ahmed Kotbi, Pierre Barroy, Michael Lejeune, Ilham Hamdi Alaoui, Abdoul-Azizou Aziraf AFO, Andreas Zeinert, Mustapha Jouiad
{"title":"PECVD沉积用于光伏组件保护的疏水性SiOxCy:H薄膜","authors":"Ahmed Kotbi, Pierre Barroy, Michael Lejeune, Ilham Hamdi Alaoui, Abdoul-Azizou Aziraf AFO, Andreas Zeinert, Mustapha Jouiad","doi":"10.1007/s11082-025-08356-0","DOIUrl":null,"url":null,"abstract":"<div>\n \n <p>This study explores the optimization of SiO<sub>x</sub>C<sub>y</sub>:H thin films fabricated under varying radio frequency power conditions to achieve enhanced water repeal while preserving photovoltaic (PV) performance. Thin films derived from hexamethyldisiloxane were deposited on glass substrates via plasma-enhanced chemical vapor deposition (PECVD). The sessile drop technique was used to assess the water contact angle. Our findings indicate that SiO<sub>x</sub>C<sub>y</sub>:H films deposited at 200 W and 300 W exhibit hydrophilic behavior (θ < 90°), whereas the film produced at 100 W achieves hydrophobicity (θ > 90°), optimizing surface wettability for water-repellent applications. Notably, applying the 100 W film to a solar cell resulted in minimal efficiency loss (0.47%) and only a 1% decrease in fill factor, confirming that PV performance remained practically unaltered. These findings highlight the potential of SiO<sub>x</sub>C<sub>y</sub>:H thin films fabricated at optimized conditions to provide effective protection against moisture without compromising solar cell functionality.</p>\n </div>","PeriodicalId":720,"journal":{"name":"Optical and Quantum Electronics","volume":"57 8","pages":""},"PeriodicalIF":4.0000,"publicationDate":"2025-08-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Hydrophobic SiOxCy:H thin films deposited by PECVD for photovoltaic module protection\",\"authors\":\"Ahmed Kotbi, Pierre Barroy, Michael Lejeune, Ilham Hamdi Alaoui, Abdoul-Azizou Aziraf AFO, Andreas Zeinert, Mustapha Jouiad\",\"doi\":\"10.1007/s11082-025-08356-0\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>\\n \\n <p>This study explores the optimization of SiO<sub>x</sub>C<sub>y</sub>:H thin films fabricated under varying radio frequency power conditions to achieve enhanced water repeal while preserving photovoltaic (PV) performance. Thin films derived from hexamethyldisiloxane were deposited on glass substrates via plasma-enhanced chemical vapor deposition (PECVD). The sessile drop technique was used to assess the water contact angle. Our findings indicate that SiO<sub>x</sub>C<sub>y</sub>:H films deposited at 200 W and 300 W exhibit hydrophilic behavior (θ < 90°), whereas the film produced at 100 W achieves hydrophobicity (θ > 90°), optimizing surface wettability for water-repellent applications. Notably, applying the 100 W film to a solar cell resulted in minimal efficiency loss (0.47%) and only a 1% decrease in fill factor, confirming that PV performance remained practically unaltered. These findings highlight the potential of SiO<sub>x</sub>C<sub>y</sub>:H thin films fabricated at optimized conditions to provide effective protection against moisture without compromising solar cell functionality.</p>\\n </div>\",\"PeriodicalId\":720,\"journal\":{\"name\":\"Optical and Quantum Electronics\",\"volume\":\"57 8\",\"pages\":\"\"},\"PeriodicalIF\":4.0000,\"publicationDate\":\"2025-08-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical and Quantum Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s11082-025-08356-0\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical and Quantum Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s11082-025-08356-0","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Hydrophobic SiOxCy:H thin films deposited by PECVD for photovoltaic module protection
This study explores the optimization of SiOxCy:H thin films fabricated under varying radio frequency power conditions to achieve enhanced water repeal while preserving photovoltaic (PV) performance. Thin films derived from hexamethyldisiloxane were deposited on glass substrates via plasma-enhanced chemical vapor deposition (PECVD). The sessile drop technique was used to assess the water contact angle. Our findings indicate that SiOxCy:H films deposited at 200 W and 300 W exhibit hydrophilic behavior (θ < 90°), whereas the film produced at 100 W achieves hydrophobicity (θ > 90°), optimizing surface wettability for water-repellent applications. Notably, applying the 100 W film to a solar cell resulted in minimal efficiency loss (0.47%) and only a 1% decrease in fill factor, confirming that PV performance remained practically unaltered. These findings highlight the potential of SiOxCy:H thin films fabricated at optimized conditions to provide effective protection against moisture without compromising solar cell functionality.
期刊介绍：
Optical and Quantum Electronics provides an international forum for the publication of original research papers, tutorial reviews and letters in such fields as optical physics, optical engineering and optoelectronics. Special issues are published on topics of current interest.
Optical and Quantum Electronics is published monthly. It is concerned with the technology and physics of optical systems, components and devices, i.e., with topics such as: optical fibres; semiconductor lasers and LEDs; light detection and imaging devices; nanophotonics; photonic integration and optoelectronic integrated circuits; silicon photonics; displays; optical communications from devices to systems; materials for photonics (e.g. semiconductors, glasses, graphene); the physics and simulation of optical devices and systems; nanotechnologies in photonics (including engineered nano-structures such as photonic crystals, sub-wavelength photonic structures, metamaterials, and plasmonics); advanced quantum and optoelectronic applications (e.g. quantum computing, memory and communications, quantum sensing and quantum dots); photonic sensors and bio-sensors; Terahertz phenomena; non-linear optics and ultrafast phenomena; green photonics.
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