MoS2场效应晶体管关键电学参数随层数的权衡

IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Samiksha Bhatia, Ramesh Singh Bisht, Rehan Ahmed and Pramod Kumar*, 
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引用次数: 0

摘要

二硫化钼(MoS2)场效应晶体管(fet)的电学性能随层厚的变化而显著变化;然而,大多数研究主要集中在迁移率上,而其他电参数的变化往往被忽视。在这里,我们系统地评估了阈值电压(Vth)、导通电流(Ion)、关断电流(Ioff)、离子/关断比、迁移率、亚阈值摆幅(SS)和关断电压(Vp)在从几层到超过100层的层厚度范围内的变化。结果表明,随着二硫化钼层数从几层增加到100层以上,迁移率逐渐提高,最终趋于饱和。然而,这种增强伴随着以下权衡,即Ioff增加,Ion/Ioff比降低,Vth负移,SS恶化和Vp上升。场效应晶体管特性从5层到128层比较,并观察到的流动性增加26厘米2 / V 81 cm2 / V·s·s,离子增加从7.4×2.0×10 - 6 A /μm的纯/μm, Ioff增加从1.5×10 - 12 / 7.2μm×换/μm,离子/ Ioff比率从4.7×106降低到2.8×102年Vth变化∼−−29日9 V,党卫军增加从0.65 V / 10年2.34 V / 10年,从2.9 V和副总裁增加到超过10 V。在实际应用中,必须通过考虑所有这些关键电气参数来评估电子设备的整体性能。这些对各种参数集之间权衡的观察限制了可用于最佳器件性能的二维材料厚度的上限。基于这些趋势,低于~ 50层的MoS2通道可以提供迁移率、栅极控制和开关效率的最佳平衡,使其更适合逻辑电路应用。对于优先考虑高电流驱动的应用,例如在RF/放大器设计中,根据具体设计要求,更厚的通道(50-100层)可能是合适的。这些发现对于下一代基于2D的纳米电子学至关重要,可以指导多层2D材料的最佳厚度范围的选择,以用于不同电气参数的相对重要性根据预期目的而变化的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Trade-Off in Key Electrical Parameters of MoS2 Field-Effect Transistors with the Number of Layers

Trade-Off in Key Electrical Parameters of MoS2 Field-Effect Transistors with the Number of Layers

The electrical properties of molybdenum disulfide (MoS2) field-effect transistors (FETs) vary significantly with layer thickness; yet, most studies have focused primarily on mobility, and the variations in other electrical parameters have often been overlooked. Here, we systemically evaluate the variation in threshold voltage (Vth), on current (Ion), off current (Ioff), Ion/Ioff ratio, mobility, subthreshold swing (SS), and pinch-off voltage (Vp) across a range of layer thicknesses from a few layers to over 100 layers. The results indicate that as the number of MoS2 layers increases from a few layers to over 100 layers, the mobility improves and eventually saturates. However, this enhancement comes with the following trade-offs, which are increased Ioff, decreased Ion/Ioff ratio, negative shift in Vth, deteriorating SS, and rising Vp. FET characteristics from 5 layers to 128 layers were compared, and it is observed that the mobility increases from 26 cm2/V·s to 81 cm2/V·s, Ion increases from 7.4 × 10–6 A/μm to 2.0 × 10–5 A/μm, Ioff increases from 1.5 × 10–12 A/μm to 7.2 × 10–8 A/μm, the Ion/Ioff ratio decreases from 4.7 × 106 to 2.8 × 102, Vth changes from ∼−9 V to −29 V, SS increases from 0.65 V/decade to 2.34 V/decade, and Vp increases from 2.9 V to beyond 10 V. For practical applications, the overall performance of an electronic device must be assessed by taking into consideration all these key electrical parameters. These observations of the trade-off between various parameter sets constrain the upper limit of the thickness of 2D materials that can be used for optimum device performance. Based on these trends, MoS2 channels below ∼50 layers may provide an optimal balance of mobility, gate control, and switching efficiency, making them better suited for logic circuit applications. For applications prioritizing high current drive, such as in RF/amplifier designs, thicker channels (50–100 layers) may be appropriate, depending on the specific design requirement. These findings are essential for next-generation 2D-based nanoelectronics by guiding the selection of the optimal thickness range of multilayer 2D materials for applications where the relative significance of different electrical parameters varies based on the intended purpose.

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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
期刊介绍: ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric. Indexed/​Abstracted: Web of Science SCIE Scopus CAS INSPEC Portico
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