多光子光刻用高荧光和低荧光光引发剂

IF 4.7 2区 化学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Dimitra Ladika*, Michalis Stavrou, Gordon Zyla, Kostas Parkatzidis, Maria Androulidaki, Frederic Dumur, Maria Farsari and David Gray*, 
{"title":"多光子光刻用高荧光和低荧光光引发剂","authors":"Dimitra Ladika*,&nbsp;Michalis Stavrou,&nbsp;Gordon Zyla,&nbsp;Kostas Parkatzidis,&nbsp;Maria Androulidaki,&nbsp;Frederic Dumur,&nbsp;Maria Farsari and David Gray*,&nbsp;","doi":"10.1021/acsapm.5c01802","DOIUrl":null,"url":null,"abstract":"<p >Multiphoton lithography (MPL), an additive manufacturing method, enables the fabrication of intricate three-dimensional micro- and nanostructures with high spatial resolution, crucial for applications in photonics, micro-optics, and biomedicine. Central to the performance of the MPL is the choice of photoinitiator (PI), which governs polymerization efficiency, resolution, and application-specific functionality. However, conventional PIs often suffer from drawbacks such as high autofluorescence and poor spectral selectivity, limiting their utility in fluorescence-sensitive applications. This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push–pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.</p>","PeriodicalId":7,"journal":{"name":"ACS Applied Polymer Materials","volume":"7 15","pages":"10108–10120"},"PeriodicalIF":4.7000,"publicationDate":"2025-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsapm.5c01802","citationCount":"0","resultStr":"{\"title\":\"High- and Low-Fluorescent Photoinitiators for Multiphoton Lithography\",\"authors\":\"Dimitra Ladika*,&nbsp;Michalis Stavrou,&nbsp;Gordon Zyla,&nbsp;Kostas Parkatzidis,&nbsp;Maria Androulidaki,&nbsp;Frederic Dumur,&nbsp;Maria Farsari and David Gray*,&nbsp;\",\"doi\":\"10.1021/acsapm.5c01802\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >Multiphoton lithography (MPL), an additive manufacturing method, enables the fabrication of intricate three-dimensional micro- and nanostructures with high spatial resolution, crucial for applications in photonics, micro-optics, and biomedicine. Central to the performance of the MPL is the choice of photoinitiator (PI), which governs polymerization efficiency, resolution, and application-specific functionality. However, conventional PIs often suffer from drawbacks such as high autofluorescence and poor spectral selectivity, limiting their utility in fluorescence-sensitive applications. This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push–pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.</p>\",\"PeriodicalId\":7,\"journal\":{\"name\":\"ACS Applied Polymer Materials\",\"volume\":\"7 15\",\"pages\":\"10108–10120\"},\"PeriodicalIF\":4.7000,\"publicationDate\":\"2025-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://pubs.acs.org/doi/pdf/10.1021/acsapm.5c01802\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Polymer Materials\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://pubs.acs.org/doi/10.1021/acsapm.5c01802\",\"RegionNum\":2,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Polymer Materials","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsapm.5c01802","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

多光子光刻(MPL)是一种增材制造方法,可以制造复杂的三维微纳米结构,具有高空间分辨率,对光子学,微光学和生物医学的应用至关重要。MPL性能的核心是光引发剂(PI)的选择,它决定了聚合效率、分辨率和特定应用的功能。然而,传统的pi经常遭受诸如高自身荧光和较差的光谱选择性等缺点,限制了它们在荧光敏感应用中的效用。本文系统研究了实验室制备的低荧光pi (LF,基于吲哚-1,3-二酮的推挽化合物)的非线性光学(NLO)特性,并将其与高荧光pi (HF,基于三苯胺的醛)进行了比较,并检验了它们对MPL的有效性。采用双光束起始阈值(2-BIT)方法和z扫描技术,在溶液中和集成到混合光刻胶SZ2080中研究了pi的NLO特性。NLO性能表征和制造测试在单一光学装置中进行,在类似的光谱时间激光辐射条件下(脉冲宽度,150 fs;波长,780纳米)。这种建议的方法可以直接有效地评估aPI对MPL的适用性。通过光致发光分析发现,lf - pi的荧光强度比hf - pi低2个数量级,而NLO吸收相关参数则高出10倍。这表明,高荧光可能会干扰有效聚合所必需的吸收过程,从而与NLO性能竞争。最重要的是,当嵌入SZ2080中时,lf - pi的结构性能可与SBB(低荧光mpl制造结构的基准材料)相比较,并且所得到的打印结构表现出更好的选择性荧光响应,这表明它们在生物相关应用的打印支架中具有强大的潜力,而高荧光信号通常会阻碍信号的检测和分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High- and Low-Fluorescent Photoinitiators for Multiphoton Lithography

Multiphoton lithography (MPL), an additive manufacturing method, enables the fabrication of intricate three-dimensional micro- and nanostructures with high spatial resolution, crucial for applications in photonics, micro-optics, and biomedicine. Central to the performance of the MPL is the choice of photoinitiator (PI), which governs polymerization efficiency, resolution, and application-specific functionality. However, conventional PIs often suffer from drawbacks such as high autofluorescence and poor spectral selectivity, limiting their utility in fluorescence-sensitive applications. This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push–pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.

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来源期刊
CiteScore
7.20
自引率
6.00%
发文量
810
期刊介绍: ACS Applied Polymer Materials is an interdisciplinary journal publishing original research covering all aspects of engineering, chemistry, physics, and biology relevant to applications of polymers. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrates fundamental knowledge in the areas of materials, engineering, physics, bioscience, polymer science and chemistry into important polymer applications. The journal is specifically interested in work that addresses relationships among structure, processing, morphology, chemistry, properties, and function as well as work that provide insights into mechanisms critical to the performance of the polymer for applications.
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