Dimitra Ladika*, Michalis Stavrou, Gordon Zyla, Kostas Parkatzidis, Maria Androulidaki, Frederic Dumur, Maria Farsari and David Gray*,
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This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push–pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.</p>","PeriodicalId":7,"journal":{"name":"ACS Applied Polymer Materials","volume":"7 15","pages":"10108–10120"},"PeriodicalIF":4.7000,"publicationDate":"2025-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsapm.5c01802","citationCount":"0","resultStr":"{\"title\":\"High- and Low-Fluorescent Photoinitiators for Multiphoton Lithography\",\"authors\":\"Dimitra Ladika*, Michalis Stavrou, Gordon Zyla, Kostas Parkatzidis, Maria Androulidaki, Frederic Dumur, Maria Farsari and David Gray*, \",\"doi\":\"10.1021/acsapm.5c01802\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >Multiphoton lithography (MPL), an additive manufacturing method, enables the fabrication of intricate three-dimensional micro- and nanostructures with high spatial resolution, crucial for applications in photonics, micro-optics, and biomedicine. Central to the performance of the MPL is the choice of photoinitiator (PI), which governs polymerization efficiency, resolution, and application-specific functionality. However, conventional PIs often suffer from drawbacks such as high autofluorescence and poor spectral selectivity, limiting their utility in fluorescence-sensitive applications. This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push–pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.</p>\",\"PeriodicalId\":7,\"journal\":{\"name\":\"ACS Applied Polymer Materials\",\"volume\":\"7 15\",\"pages\":\"10108–10120\"},\"PeriodicalIF\":4.7000,\"publicationDate\":\"2025-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://pubs.acs.org/doi/pdf/10.1021/acsapm.5c01802\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Polymer Materials\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://pubs.acs.org/doi/10.1021/acsapm.5c01802\",\"RegionNum\":2,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Polymer Materials","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsapm.5c01802","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
High- and Low-Fluorescent Photoinitiators for Multiphoton Lithography
Multiphoton lithography (MPL), an additive manufacturing method, enables the fabrication of intricate three-dimensional micro- and nanostructures with high spatial resolution, crucial for applications in photonics, micro-optics, and biomedicine. Central to the performance of the MPL is the choice of photoinitiator (PI), which governs polymerization efficiency, resolution, and application-specific functionality. However, conventional PIs often suffer from drawbacks such as high autofluorescence and poor spectral selectivity, limiting their utility in fluorescence-sensitive applications. This work presents a systematic study on the nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF, indane-1,3-dione-based push–pull compounds), comparing them to high-fluorescence PIs (HF, triphenylamine-based aldehydes), and examines their effectiveness for MPL. The NLO properties of the PIs were investigated employing the two-beam initiation threshold (2-BIT) method and Z-scan technique both in solution and integrated into the hybrid photoresist SZ2080. The characterization of NLO properties and manufacturing tests were performed within a single optical setup, under similar spectrotemporal laser radiation conditions (pulse width, 150 fs; wavelength, 780 nm). This proposed approach allows for a straightforward and efficient evaluation of the suitability of aPI for MPL. LF-PIs were found to be up to 2 orders of magnitude less fluorescent than HF-PIs, as determined by photoluminescence analysis, and exhibited up to 10-fold higher NLO absorption-related parameters. This indicates that high fluorescence may compete with the NLO performance by interfering with absorption processes essential for effective polymerization. Most importantly, LF-PIs enabled structuring performance comparable to that of SBB (a benchmark material for low-fluorescent MPL-fabricated structures) when embedded in SZ2080, and the resulting printed structures exhibited an improved selective fluorescence response, indicating their strong potential for printing scaffolds in biorelated applications, where a high fluorescent signal usually hinders signal detection and analysis.
期刊介绍:
ACS Applied Polymer Materials is an interdisciplinary journal publishing original research covering all aspects of engineering, chemistry, physics, and biology relevant to applications of polymers.
The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrates fundamental knowledge in the areas of materials, engineering, physics, bioscience, polymer science and chemistry into important polymer applications. The journal is specifically interested in work that addresses relationships among structure, processing, morphology, chemistry, properties, and function as well as work that provide insights into mechanisms critical to the performance of the polymer for applications.