NiFe/KTaO3肖特基结抗欧姆效应增强

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-08-06 DOI:10.1063/5.0277656

Simei Ran, Yifei Wang, Chenhao Duan, Hong Yan, Kexin Jin, Shuanhu Wang

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引用次数: 0

摘要

肖特基结中的反欧姆效应是非平衡载流子扩散过程中一个有趣的现象。当这种现象发生时，在恒定的扩散电流下，电压随电阻率的增加而降低。与p-Si/NiFe肖特基结相比，本研究采用带隙更宽的KTaO3作为衬底，抗欧姆效应显著增强。通过深入研究，我们排除了衬底电阻率的影响，最终将抗欧姆效应的增强归因于KTaO3/NiFe结的理想系数降低。通过分析各向异性横向光电压（ALPV）与各向异性磁阻之间的关系，发现ALPV对温度的理论依赖性与实验结果一致。本研究为进一步优化基于肖特基结的电子器件的性能提供了思路和理论基础。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Enhanced anti-Ohmic effect in NiFe/KTaO3 Schottky junction

The anti-Ohmic effect in a Schottky junction is an interesting phenomenon in the process of non-equilibrium carriers' diffusion. When this phenomenon occurs, the voltage decreases with the increase in the resistivity under a constant diffusion current. Compared with the p-Si/NiFe Schottky junction, KTaO3 with a wider bandgap is used as the substrate in this work, and the anti-Ohmic effect is significantly enhanced. Through in-depth investigation, we have ruled out the influence of substrate resistivity and finally attributed the enhancement of the anti-Ohmic effect to a decreased ideality factor in the KTaO3/NiFe junction. By analyzing the relationship between anisotropic lateral photovoltage (ALPV) and anisotropic magnetoresistance, it is found that the theoretical dependence of ALPV on temperature is consistent with the experimental results. This research provides an idea and a theoretical basis for further optimizing the performance of electronic devices based on Schottky junctions.

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.