Photocorrosion of metal sulfides: Mechanism, characterization, anti-photocorrosion strategies and solar catalysis applications

Metal sulfides (MSs) have emerged as promising photocatalysts owing to their tunable electronic band structure, robust visible-light absorption properties, and exceptional redox activity. However, their practical applications are severely hampered by photocorrosion, which is primarily attributed to photogenerated holes and interactions with the surrounding medium. While significant efforts have been dedicated to enhancing their stability and catalytic activity through various modification strategies, a comprehensive understanding of the photocorrosion mechanisms, characterization techniques, and anti-photocorrosion approaches remains unclear. This review provides an in-depth analysis of the current advances in addressing photocorrosion in MSs. A systematic overview of diverse anti-photocorrosion strategies is presented, including elemental doping, defect engineering, cocatalyst incorporation, protective layer deposition, polarization engineering, heterojunction, morphological optimization, and reaction medium modulation. Additionally, a thorough discussion of advanced in-situ/ex-situ characterization, such as scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), Raman, X-ray photoelectron spectroscopy (XPS), inductively coupled plasma (ICP), and electron spin resonance (ESR), is provided to evaluate photocorrosion processes. The comparative advantages and limitations of each strategy and characterization tool are critically discussed, offering valuable insights for the rational design of highly efficient and durable MSs photocatalysts. This review aims to deepen the fundamental understanding of photocorrosion mechanisms and provide feasible guidelines for advancing the practical application of MSs in photocatalytic systems.