Lokanath Mohapatra, Akshay Kumar Sonwane, Sonali Samal, Tushar Chauhan, Parveen Garg, Uday Deshpande, M. K. Tiwari and Ajay K. Kushwaha
{"title":"合成后氮掺杂提高Zn2SnO4纳米结构光催化水电解性能。","authors":"Lokanath Mohapatra, Akshay Kumar Sonwane, Sonali Samal, Tushar Chauhan, Parveen Garg, Uday Deshpande, M. K. Tiwari and Ajay K. Kushwaha","doi":"10.1039/D5NR01576F","DOIUrl":null,"url":null,"abstract":"<p >Nitrogen-doped Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructures were developed <em>via</em> hydrothermal treatment. Urea (CH<small><sub>4</sub></small>N<small><sub>2</sub></small>O) was used as the nitrogen source to achieve post-growth nitrogen doping in Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructures. Nitrogen doping resulted in morphological distortion. The elemental study proved that nitrogen concentration increased with an increase in the concentration of urea in the precursor solutions. The vibration modes corresponding to the Zn–N and Sn–N bonds confirmed the incorporation of nitrogen into the crystal lattice of Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small>. XPS analysis revealed that higher nitrogen doping concentrations led to the substitutional incorporation of nitrogen. Nitrogen doping in Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> introduced impurity levels in the electronic band structure and reduced its optical band gap (from 2.7 eV to 2.4 eV). Consequently, the Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructure with approximately 1.9 at% nitrogen showed the highest photocurrent density of 124 μA cm<small><sup>−2</sup></small> at 1.23 V <em>vs.</em> RHE, representing approximately 2.6-fold improvement in photocurrent compared to that of undoped Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructures. Optimized nitrogen doping resulted in approximately 89% charge injection efficiency along with the lowest charge transfer resistance.</p>","PeriodicalId":92,"journal":{"name":"Nanoscale","volume":" 32","pages":" 18852-18865"},"PeriodicalIF":5.1000,"publicationDate":"2025-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Enhancing the photocatalytic water electrolysis performance of Zn2SnO4 nanostructures via post-synthesis nitrogen doping†\",\"authors\":\"Lokanath Mohapatra, Akshay Kumar Sonwane, Sonali Samal, Tushar Chauhan, Parveen Garg, Uday Deshpande, M. K. Tiwari and Ajay K. Kushwaha\",\"doi\":\"10.1039/D5NR01576F\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >Nitrogen-doped Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructures were developed <em>via</em> hydrothermal treatment. Urea (CH<small><sub>4</sub></small>N<small><sub>2</sub></small>O) was used as the nitrogen source to achieve post-growth nitrogen doping in Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructures. Nitrogen doping resulted in morphological distortion. The elemental study proved that nitrogen concentration increased with an increase in the concentration of urea in the precursor solutions. The vibration modes corresponding to the Zn–N and Sn–N bonds confirmed the incorporation of nitrogen into the crystal lattice of Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small>. XPS analysis revealed that higher nitrogen doping concentrations led to the substitutional incorporation of nitrogen. Nitrogen doping in Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> introduced impurity levels in the electronic band structure and reduced its optical band gap (from 2.7 eV to 2.4 eV). Consequently, the Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructure with approximately 1.9 at% nitrogen showed the highest photocurrent density of 124 μA cm<small><sup>−2</sup></small> at 1.23 V <em>vs.</em> RHE, representing approximately 2.6-fold improvement in photocurrent compared to that of undoped Zn<small><sub>2</sub></small>SnO<small><sub>4</sub></small> nanostructures. Optimized nitrogen doping resulted in approximately 89% charge injection efficiency along with the lowest charge transfer resistance.</p>\",\"PeriodicalId\":92,\"journal\":{\"name\":\"Nanoscale\",\"volume\":\" 32\",\"pages\":\" 18852-18865\"},\"PeriodicalIF\":5.1000,\"publicationDate\":\"2025-07-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nanoscale\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://pubs.rsc.org/en/content/articlelanding/2025/nr/d5nr01576f\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanoscale","FirstCategoryId":"88","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2025/nr/d5nr01576f","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
Enhancing the photocatalytic water electrolysis performance of Zn2SnO4 nanostructures via post-synthesis nitrogen doping†
Nitrogen-doped Zn2SnO4 nanostructures were developed via hydrothermal treatment. Urea (CH4N2O) was used as the nitrogen source to achieve post-growth nitrogen doping in Zn2SnO4 nanostructures. Nitrogen doping resulted in morphological distortion. The elemental study proved that nitrogen concentration increased with an increase in the concentration of urea in the precursor solutions. The vibration modes corresponding to the Zn–N and Sn–N bonds confirmed the incorporation of nitrogen into the crystal lattice of Zn2SnO4. XPS analysis revealed that higher nitrogen doping concentrations led to the substitutional incorporation of nitrogen. Nitrogen doping in Zn2SnO4 introduced impurity levels in the electronic band structure and reduced its optical band gap (from 2.7 eV to 2.4 eV). Consequently, the Zn2SnO4 nanostructure with approximately 1.9 at% nitrogen showed the highest photocurrent density of 124 μA cm−2 at 1.23 V vs. RHE, representing approximately 2.6-fold improvement in photocurrent compared to that of undoped Zn2SnO4 nanostructures. Optimized nitrogen doping resulted in approximately 89% charge injection efficiency along with the lowest charge transfer resistance.
期刊介绍:
Nanoscale is a high-impact international journal, publishing high-quality research across nanoscience and nanotechnology. Nanoscale publishes a full mix of research articles on experimental and theoretical work, including reviews, communications, and full papers.Highly interdisciplinary, this journal appeals to scientists, researchers and professionals interested in nanoscience and nanotechnology, quantum materials and quantum technology, including the areas of physics, chemistry, biology, medicine, materials, energy/environment, information technology, detection science, healthcare and drug discovery, and electronics.