利用InxAl1-xAs缓冲层组成过调增强扩展波长InxGa1-xAs焦平面阵列的性能

IF 2.1 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Xiaojuan Chen;Bowen Liu;Jifeng Cheng;Liyi Yang;Runze Xia;Yingjie Ma;Xiumei Shao;Yi Gu;Xue Li;Haimei Gong;Jiaxiong Fang
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引用次数: 0

摘要

通过大幅度增加线性级配Inx Al ${}_{\text {1-x}}$ As缓冲层的过冲成分,可以显著提高截止波长为$2.2~\mu $ m的In0.75 Ga0.25 As焦平面阵列(fpa)的性能。在线性级配Inx Al ${}_{\text {1-x}}$ As的末端成分x=0.77和x=0.85条件下,在常规和大过冲外延晶片上分别制备了像素间距为$23~ $ mu $ m的$640\ × 488$平面fpa。与常规fpa的2.1\ × 10 ^{-9}$ A/cm2相比,大过冲fpa在150k时的暗电流密度降低了一个数量级,为1.1 \ × 10 ^{-10}$ A/cm2。在测量的整个积分时间范围内,同时观察到被抑制的暗信号和暗噪声电压。此外,测量到的光响应信号电压的非均匀性从16.4%急剧下降到2.9%,而峰值探测率从$7.1 \times 10 ^{12}$ cmHz ${}^{1/2}$ W−1大幅上升到$1.8 \times 10 ^{13}$ cmHz ${}^{1/2}$ W−1。还提供了增强信噪比的实验室成像演示。这些结果表明,大过冲外延技术可以作为晶格不匹配的Inx Ga ${}_{\text {1-x}}$ fpa进一步提高性能的高度可行的途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhanced Performance of Extended Wavelength InxGa1–xAs Focal Plane Arrays via Compositional Overshooting of InxAl1–xAs Buffer Layer
Performances of In0.75 Ga0.25 As focal plane arrays (FPAs) with an extended cutoff wavelength of $2.2~\mu $ m are remarkably improved by largely increasing the overshooting composition of the linearly-grading Inx Al ${}_{\text {1-x}}$ As buffer layer. Zinc-diffused planar $640\times 488$ FPAs with a pixel pitch of $23~\mu $ m are fabricated on both the regular and the large overshooting epi-wafers with x=0.77 and x=0.85 for the end compositions of the linearly-grading Inx Al ${}_{\text {1-x}}$ As, respectively. An order of magnitude lower dark current density of $1.1 \times 10 ^{-10}$ A/cm2 is achieved at 150 K for the large overshooting FPAs when comparing with $2.1\times 10 ^{-9}$ A/cm2 for the regular FPAs. Suppressed dark signal and dark noise voltages are observed simultaneously over the measured whole integration time range. Moreover, the measured non-uniformity of the light response signal voltage drastically dropped from 16.4% to 2.9% while the peak detectivity substantially jumped from $7.1 \times 10 ^{12}$ to $1.8 \times 10 ^{13}$ cmHz ${}^{1/2}$ W−1. A signal to noise ratio enhanced laboratory imaging demonstration is also provided. These results suggest the large overshooting epitaxial technology can serve as a highly viable route for the lattice-mismatched Inx Ga ${}_{\text {1-x}}$ As FPAs towards further performance enhancement.
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来源期刊
IEEE Journal of Quantum Electronics
IEEE Journal of Quantum Electronics 工程技术-工程:电子与电气
CiteScore
4.70
自引率
4.00%
发文量
99
审稿时长
3.0 months
期刊介绍: The IEEE Journal of Quantum Electronics is dedicated to the publication of manuscripts reporting novel experimental or theoretical results in the broad field of the science and technology of quantum electronics. The Journal comprises original contributions, both regular papers and letters, describing significant advances in the understanding of quantum electronics phenomena or the demonstration of new devices, systems, or applications. Manuscripts reporting new developments in systems and applications must emphasize quantum electronics principles or devices. The scope of JQE encompasses the generation, propagation, detection, and application of coherent electromagnetic radiation having wavelengths below one millimeter (i.e., in the submillimeter, infrared, visible, ultraviolet, etc., regions). Whether the focus of a manuscript is a quantum-electronic device or phenomenon, the critical factor in the editorial review of a manuscript is the potential impact of the results presented on continuing research in the field or on advancing the technological base of quantum electronics.
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