“硅富集”现象及其引发损伤的电子缺陷迅速增加对熔融二氧化硅激光损伤抗力的影响机理

IF 6.9 2区 材料科学 Q2 CHEMISTRY, PHYSICAL
Dinghuai Yang , Zhichao Liu , Zican Yang , Linjie Zhao , Jian Cheng , Mingjun Chen , Shengfei Wang , Feng Geng , Yazhou Sun , Qiao Xu
{"title":"“硅富集”现象及其引发损伤的电子缺陷迅速增加对熔融二氧化硅激光损伤抗力的影响机理","authors":"Dinghuai Yang ,&nbsp;Zhichao Liu ,&nbsp;Zican Yang ,&nbsp;Linjie Zhao ,&nbsp;Jian Cheng ,&nbsp;Mingjun Chen ,&nbsp;Shengfei Wang ,&nbsp;Feng Geng ,&nbsp;Yazhou Sun ,&nbsp;Qiao Xu","doi":"10.1016/j.apsusc.2025.164157","DOIUrl":null,"url":null,"abstract":"<div><div>First-onset intense laser-induced damage of fused silica and other optics would cause severe damage propagation and rapid component failure within a short subsequent period. Although this ubiquitous phenomenon has been widely acknowledged, its traceable dominant causes and corresponding action mechanisms remain undetermined. It hinders further understanding of and effective solutions to the rapid scrapping of damaged optics. In this study, the special and critical first-onset damage products (local “Si-enrichment” regions) in the plasma-induced phase-change zones were first discovered. Interestingly, these hazardous first-onset damage products were also identified on damaged BK7 glass surfaces, suggesting a previously unrecognized universal effect. Based on steady-state photoluminescence spectrum/imaging characterization, laser-induced damage tests, elemental analysis and photoelectron theories, the influence of “Si-enrichment” regions was systematically studied. The occurrence of “Si-enrichment” regions significantly increased the densities of various absorbing electronic defects (ODCII, STE, E’-Center and NBOHC) and the proportions of more hazardous electronic defects (ODCII and STE) containing more seed electrons, seriously weakening the laser damage resistance of optical components. Based on the TRPP detection, the developed electron excitation model under defect levels, and thermal-plasma-induced damage molecular dynamics simulation, the formation mechanisms of “Si-enrichment” regions were revealed. These regions would form in phase-change damage zones within ∼ ns after damage initiation. The “explosive” phase-change-induced elemental decomposition converted massive covalent Si and O elements into corresponding free states, which constituted the first cause of the formation of “Si-enrichment” regions. Active free-state O atoms could combine to form the oxygen gas released into the air, resulting in significant loss of O elements. In contrast, massive relatively stable Si elements could ultimately deposit on damaged surfaces, causing the “Si-enrichment” phenomenon. This constitutes the second cause of the formation of “Si-enrichment” regions. To sum up, this work determines the traceable dominant causes of the rapid scrapping issues of damaged optics and corresponding action mechanisms. It is meaningful for understanding and addressing the damage-induced rapid scrapping issues of fused silica and other agnate silicate glass applied in intense laser fields.</div></div>","PeriodicalId":247,"journal":{"name":"Applied Surface Science","volume":"712 ","pages":"Article 164157"},"PeriodicalIF":6.9000,"publicationDate":"2025-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence mechanisms of the “Si-enrichment” phenomenon and the consequent rapid increase of damage-triggering electronic defects on laser damage resistance of fused silica\",\"authors\":\"Dinghuai Yang ,&nbsp;Zhichao Liu ,&nbsp;Zican Yang ,&nbsp;Linjie Zhao ,&nbsp;Jian Cheng ,&nbsp;Mingjun Chen ,&nbsp;Shengfei Wang ,&nbsp;Feng Geng ,&nbsp;Yazhou Sun ,&nbsp;Qiao Xu\",\"doi\":\"10.1016/j.apsusc.2025.164157\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>First-onset intense laser-induced damage of fused silica and other optics would cause severe damage propagation and rapid component failure within a short subsequent period. Although this ubiquitous phenomenon has been widely acknowledged, its traceable dominant causes and corresponding action mechanisms remain undetermined. It hinders further understanding of and effective solutions to the rapid scrapping of damaged optics. In this study, the special and critical first-onset damage products (local “Si-enrichment” regions) in the plasma-induced phase-change zones were first discovered. Interestingly, these hazardous first-onset damage products were also identified on damaged BK7 glass surfaces, suggesting a previously unrecognized universal effect. Based on steady-state photoluminescence spectrum/imaging characterization, laser-induced damage tests, elemental analysis and photoelectron theories, the influence of “Si-enrichment” regions was systematically studied. The occurrence of “Si-enrichment” regions significantly increased the densities of various absorbing electronic defects (ODCII, STE, E’-Center and NBOHC) and the proportions of more hazardous electronic defects (ODCII and STE) containing more seed electrons, seriously weakening the laser damage resistance of optical components. Based on the TRPP detection, the developed electron excitation model under defect levels, and thermal-plasma-induced damage molecular dynamics simulation, the formation mechanisms of “Si-enrichment” regions were revealed. These regions would form in phase-change damage zones within ∼ ns after damage initiation. The “explosive” phase-change-induced elemental decomposition converted massive covalent Si and O elements into corresponding free states, which constituted the first cause of the formation of “Si-enrichment” regions. Active free-state O atoms could combine to form the oxygen gas released into the air, resulting in significant loss of O elements. In contrast, massive relatively stable Si elements could ultimately deposit on damaged surfaces, causing the “Si-enrichment” phenomenon. This constitutes the second cause of the formation of “Si-enrichment” regions. To sum up, this work determines the traceable dominant causes of the rapid scrapping issues of damaged optics and corresponding action mechanisms. It is meaningful for understanding and addressing the damage-induced rapid scrapping issues of fused silica and other agnate silicate glass applied in intense laser fields.</div></div>\",\"PeriodicalId\":247,\"journal\":{\"name\":\"Applied Surface Science\",\"volume\":\"712 \",\"pages\":\"Article 164157\"},\"PeriodicalIF\":6.9000,\"publicationDate\":\"2025-07-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Surface Science\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0169433225018720\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Surface Science","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0169433225018720","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0

摘要

熔融石英和其他光学元件的初发强激光损伤会在随后的短时间内造成严重的损伤传播和快速的部件失效。尽管这一普遍现象已被广泛承认,但其可追溯的主要原因和相应的作用机制仍未确定。它阻碍了对损坏光学元件的快速报废的进一步理解和有效的解决方案。在本研究中,首次发现了等离子体诱导相变区的特殊和关键的初起损伤产物(局部“si富集”区域)。有趣的是,在破损的BK7玻璃表面也发现了这些危险的首发损伤产物,这表明以前未被认识到的普遍效应。基于稳态光致发光光谱/成像表征、激光损伤试验、元素分析和光电子理论,系统地研究了“si富集”区的影响。“si富集”区域的出现显著增加了各种吸收性电子缺陷(ODCII、STE、E ' -Center和NBOHC)的密度以及含有更多种子电子的更危险电子缺陷(ODCII和STE)的比例,严重削弱了光学元件的抗激光损伤能力。基于TRPP检测、建立的缺陷水平下的电子激发模型和热等离子体损伤分子动力学模拟,揭示了“si富集”区的形成机制。这些区域将在损伤发生后 ~ ns内的相变损伤区形成。“爆炸性”相变引发的元素分解将大量共价Si和O元素转化为相应的自由态,这是“Si富集”区形成的第一个原因。活跃的自由态O原子可以结合形成释放到空气中的氧气,导致O元素的大量损失。相反,大量相对稳定的Si元素最终会沉积在受损表面,导致“Si富集”现象。这是“富硅”区形成的第二个原因。综上所述,本工作确定了损坏光学元件快速报废问题的可追溯的主要原因和相应的作用机制。这对于理解和解决在强激光场中熔融二氧化硅和其他镁铝硅酸盐玻璃的损伤快速报废问题具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Influence mechanisms of the “Si-enrichment” phenomenon and the consequent rapid increase of damage-triggering electronic defects on laser damage resistance of fused silica

Influence mechanisms of the “Si-enrichment” phenomenon and the consequent rapid increase of damage-triggering electronic defects on laser damage resistance of fused silica

Influence mechanisms of the “Si-enrichment” phenomenon and the consequent rapid increase of damage-triggering electronic defects on laser damage resistance of fused silica
First-onset intense laser-induced damage of fused silica and other optics would cause severe damage propagation and rapid component failure within a short subsequent period. Although this ubiquitous phenomenon has been widely acknowledged, its traceable dominant causes and corresponding action mechanisms remain undetermined. It hinders further understanding of and effective solutions to the rapid scrapping of damaged optics. In this study, the special and critical first-onset damage products (local “Si-enrichment” regions) in the plasma-induced phase-change zones were first discovered. Interestingly, these hazardous first-onset damage products were also identified on damaged BK7 glass surfaces, suggesting a previously unrecognized universal effect. Based on steady-state photoluminescence spectrum/imaging characterization, laser-induced damage tests, elemental analysis and photoelectron theories, the influence of “Si-enrichment” regions was systematically studied. The occurrence of “Si-enrichment” regions significantly increased the densities of various absorbing electronic defects (ODCII, STE, E’-Center and NBOHC) and the proportions of more hazardous electronic defects (ODCII and STE) containing more seed electrons, seriously weakening the laser damage resistance of optical components. Based on the TRPP detection, the developed electron excitation model under defect levels, and thermal-plasma-induced damage molecular dynamics simulation, the formation mechanisms of “Si-enrichment” regions were revealed. These regions would form in phase-change damage zones within ∼ ns after damage initiation. The “explosive” phase-change-induced elemental decomposition converted massive covalent Si and O elements into corresponding free states, which constituted the first cause of the formation of “Si-enrichment” regions. Active free-state O atoms could combine to form the oxygen gas released into the air, resulting in significant loss of O elements. In contrast, massive relatively stable Si elements could ultimately deposit on damaged surfaces, causing the “Si-enrichment” phenomenon. This constitutes the second cause of the formation of “Si-enrichment” regions. To sum up, this work determines the traceable dominant causes of the rapid scrapping issues of damaged optics and corresponding action mechanisms. It is meaningful for understanding and addressing the damage-induced rapid scrapping issues of fused silica and other agnate silicate glass applied in intense laser fields.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Applied Surface Science
Applied Surface Science 工程技术-材料科学:膜
CiteScore
12.50
自引率
7.50%
发文量
3393
审稿时长
67 days
期刊介绍: Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信