研究了P3HT薄膜的极化发射和氧化石墨烯在界面层中的作用

Aleffe Bruno Schura , Ana Clarissa H. Kolbow , Everton Crestani Rambo , Gustavo Gonçalves Dalkiranis , Cássio Araújo do Nascimento , Romildo Jerônimo Ramos , Alexandre Marletta , Luiz Pereira , José Carlos Germino , Eralci Moreira Therézio
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摘要

在这项工作中,P3HT:PCBM薄膜沉积在PEDOT:PSS和PEDOT:PSS:GO缓冲层上,旨在利用发射椭偏仪(EE)评估氧化石墨烯(GO)对光物理性质的影响。表征,包括紫外可见吸收光谱(UV-Vis),光致发光光谱(PL),光致发光激发光谱(PLE)和EE。利用原子力显微镜(AFM)进行形态学表征。观察到氧化石墨烯显著增强了光学测量,并改善了其与PCBM的相互作用。正如在PL测量中观察到的那样,两者都表现出淬火效应,并且与ITO/PEDOT:PSS/P3HT相比,两者的能量传递更加均匀,如在EE测量中所示。拉曼分析证实了氧化石墨烯薄膜的结构变化和π共轭的变化,Ib/Ia比值表明氧化石墨烯薄膜中部分保留了分子秩序。EE提供了详细的偏振分辨发射参数;含氧化石墨烯薄膜的线极化(S1/S0)增强,圆极化组分(S3/S0)增加,表明其改善了链间相互作用和电荷转移。这些影响在氧化石墨烯和PCBM的组合体系中最为明显,这表明氧化石墨烯即使被限制在缓冲层中,也能显著改善活性层的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigating the polarized emission of P3HT films and the role of GO in the interfacial layer
In this work, P3HT:PCBM films were deposited on PEDOT:PSS and PEDOT:PSS:GO buffer layers, aiming to evaluate the impact of graphene oxide (GO) on photophysical properties using emission ellipsometry (EE). The characterization, involving Ultraviolet-Visible Absorption Spectroscopy (UV-Vis), Photoluminescence Spectroscopy (PL), Photoluminescence Excitation Spectroscopy (PLE), and EE. Morphological characterization was made using Atomic Force Microscopy (AFM). It was observed that GO significantly enhances the optical measurements and improves its interaction with PCBM. Both showed the quenching effect, as observed in the PL measurement, and contributed to a more uniform energy transfer compared to the ITO/PEDOT:PSS/P3HT, as demonstrated in the EE measurements. Raman analysis confirmed structural changes and variations in π-conjugation, with Ib/Ia ratios indicating partial preservation of molecular order in GO films. EE provided detailed polarization-resolved emission parameters; GO-containing films exhibited enhanced linear polarization (S1/S0) and increased circularly polarized components (S3/S0), suggesting improved interchain interactions and charge transfer. These effects were most evident in the combined GO and PCBM system, indicating that GO, even when restricted to the buffer layer, significantly improved the properties of the active layer.
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