离子束电流对TiO2涂层结构、光学和机械性能的影响:离子束辅助与传统电子束蒸发。

IF 2.7 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Beilstein Journal of Nanotechnology Pub Date : 2025-07-14 eCollection Date: 2025-01-01 DOI:10.3762/bjnano.16.81
Agata Obstarczyk, Urszula Wawrzaszek
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引用次数: 0

摘要

本文对电子束蒸发(EBE)和离子束辅助沉积(IBAD)制备的二氧化钛(TiO2)涂层的性能进行了比较研究。在800℃下进行后处理退火,考察其对制备的涂层性能的影响。在800℃退火后,所有涂层都发生了从无定形到锐钛矿相的转变。特别是,与传统EBE工艺制备的涂层相比,离子束电流的增加导致晶体尺寸减少了约30%。退火膜的锐钛矿晶粒平均尺寸为30.8 ~ 43.5 nm。对表面形貌和横截面进行详细的SEM分析表明,IBAD制备的TiO2薄膜比EBE制备的TiO2薄膜具有更小、更圆的颗粒和更致密的密度。所有制备的薄膜在可见波长范围内具有77 ~ 83%的高透明度。然而,退火导致EBE沉积薄膜的透明度下降了32%,而IBAD工艺沉积的薄膜的透明度下降不到10%。离子枪的使用使TiO2薄膜的硬度从2.4 GPa提高到3.5 GPa (I ibg = 4 A)。虽然退火后的涂层也有类似的关系,但硬度值低于沉积时的涂层。在磨损试验中观察到最显著的差异,其中IBAD工艺显著提高了涂层的耐磨性。这项研究强调了IBAD在制备致密、粘结性和耐用的TiO2涂层方面的潜力,该涂层具有改进的光学和机械性能,适用于需要增强耐磨性的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of ion beam current on the structural, optical, and mechanical properties of TiO2 coatings: ion beam-assisted vs conventional electron beam evaporation.

In this paper, comparative studies of selected properties of titanium dioxide (TiO2) coatings deposited using electron beam evaporation (EBE) and ion beam-assisted deposition (IBAD) are presented. Post-process annealing at 800 °C was also conducted to examine its impact on the properties of the prepared coatings. After annealing at 800 °C, a transition from amorphous to the anatase phase occurred for all coatings. In particular, an increase in ion beam current led to a reduction in crystallite size by approximately 30% compared to coatings prepared by conventional EBE process. The average anatase crystallite size for annealed films was in the range of 30.8 to 43.5 nm. A detailed SEM analysis of surface morphology and cross sections revealed that the TiO2 films prepared by IBAD had smaller, rounded grains and were denser compared to those deposited by EBE. Optical properties showed high transparency of 77-83% in the visible wavelength range for all as-prepared thin films. However, annealing caused a decrease of the transparency level by 32% for films deposited by EBE, while for films from the IBAD process the decrease was less than 10%. The use of an ion gun increased the hardness of the TiO2 films from 2.4 to 3.5 GPa (I ibg = 4 A). Although a similar relationship was observed for coatings after annealing, hardness values were lower than for as-deposited coatings. The most notable differences were observed in the abrasion tests, where the IBAD process significantly enhanced the abrasion resistance of the coatings. This research highlights the potential of IBAD to prepare dense, adhesive, and durable TiO2 coatings with improved optical and mechanical properties, suitable for applications requiring enhanced wear resistance.

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来源期刊
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.70
自引率
3.20%
发文量
109
审稿时长
2 months
期刊介绍: The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.
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