Adrian Vaghar, Georgij Jegorenkov, Gerrit A. Luinstra
{"title":"微米级Stöber颗粒的超快速碱性蚀刻介孔二氧化硅微球","authors":"Adrian Vaghar, Georgij Jegorenkov, Gerrit A. Luinstra","doi":"10.1002/adem.202500536","DOIUrl":null,"url":null,"abstract":"<p>A one-pot Stöber synthesis of silica particles in the micrometer range is established, using a continuous addition of tetraethoxy silane monomer (CAM of TEOS) to an aqueous ammonia solution with KCl in ethanol. The initial seed particle formation and growth rate are harmonized to yield monodisperse silica particles up to 2 μm (and potentially beyond) in a single step. Therefore, a diluted TEOS solution is slowly added to the ethanolic aqueous ammonia solution at 0 °C in a first phase to build seed particles. After a waiting time, a systematic particle growth is achieved by dosing ethanolic TEOS at 40 °C. The particle diameter scales with the cubic root of the amount of added TEOS. A fast etching procedure (3.5 min at 95 °C) of the received Stöber particles using 0.025 M NaOH in water is developed. The progress of the etching is monitored by the time dependance of the pH value. Quenching of the hydrolytic etching in ethanol is allowed to isolate mesoporous, monodisperse micrometer-sized silica particles with a pore volume of 160 μL g<sup>−1</sup> and a pore-size range between 100 and 4 nm (>200% enhancement over the parent particle).</p>","PeriodicalId":7275,"journal":{"name":"Advanced Engineering Materials","volume":"27 14","pages":""},"PeriodicalIF":3.3000,"publicationDate":"2025-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/adem.202500536","citationCount":"0","resultStr":"{\"title\":\"Mesoporous Silica Microspheres by Super-Fast Alkaline Etching of Micrometer-Sized Stöber Particles\",\"authors\":\"Adrian Vaghar, Georgij Jegorenkov, Gerrit A. Luinstra\",\"doi\":\"10.1002/adem.202500536\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>A one-pot Stöber synthesis of silica particles in the micrometer range is established, using a continuous addition of tetraethoxy silane monomer (CAM of TEOS) to an aqueous ammonia solution with KCl in ethanol. The initial seed particle formation and growth rate are harmonized to yield monodisperse silica particles up to 2 μm (and potentially beyond) in a single step. Therefore, a diluted TEOS solution is slowly added to the ethanolic aqueous ammonia solution at 0 °C in a first phase to build seed particles. After a waiting time, a systematic particle growth is achieved by dosing ethanolic TEOS at 40 °C. The particle diameter scales with the cubic root of the amount of added TEOS. A fast etching procedure (3.5 min at 95 °C) of the received Stöber particles using 0.025 M NaOH in water is developed. The progress of the etching is monitored by the time dependance of the pH value. Quenching of the hydrolytic etching in ethanol is allowed to isolate mesoporous, monodisperse micrometer-sized silica particles with a pore volume of 160 μL g<sup>−1</sup> and a pore-size range between 100 and 4 nm (>200% enhancement over the parent particle).</p>\",\"PeriodicalId\":7275,\"journal\":{\"name\":\"Advanced Engineering Materials\",\"volume\":\"27 14\",\"pages\":\"\"},\"PeriodicalIF\":3.3000,\"publicationDate\":\"2025-05-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/adem.202500536\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Engineering Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/adem.202500536\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Engineering Materials","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/adem.202500536","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
摘要
建立了一锅Stöber在微米范围内合成二氧化硅颗粒的方法,将四乙氧基硅烷单体(TEOS的CAM)连续添加到含有乙醇的氯化钾的氨水溶液中。最初的种子颗粒形成和生长速度被协调一致,从而在一个步骤中产生高达2 μm(甚至更大)的单分散二氧化硅颗粒。因此,在第一阶段,将稀释的TEOS溶液在0°C下缓慢加入乙醇氨水溶液中以建立种子颗粒。在等待一段时间后,通过在40°C下添加乙醇TEOS来实现系统的颗粒生长。颗粒直径与TEOS加入量的立方根成正比。采用0.025 M NaOH水溶液对所获得的Stöber颗粒进行了快速刻蚀(95℃下3.5 min)。通过pH值的时间依赖性来监测蚀刻过程。在乙醇中对水解蚀刻进行淬火,可以分离出孔径为160 μL g−1、孔径范围为100 ~ 4 nm的介孔单分散微米级二氧化硅颗粒(比母颗粒增强了200%)。
Mesoporous Silica Microspheres by Super-Fast Alkaline Etching of Micrometer-Sized Stöber Particles
A one-pot Stöber synthesis of silica particles in the micrometer range is established, using a continuous addition of tetraethoxy silane monomer (CAM of TEOS) to an aqueous ammonia solution with KCl in ethanol. The initial seed particle formation and growth rate are harmonized to yield monodisperse silica particles up to 2 μm (and potentially beyond) in a single step. Therefore, a diluted TEOS solution is slowly added to the ethanolic aqueous ammonia solution at 0 °C in a first phase to build seed particles. After a waiting time, a systematic particle growth is achieved by dosing ethanolic TEOS at 40 °C. The particle diameter scales with the cubic root of the amount of added TEOS. A fast etching procedure (3.5 min at 95 °C) of the received Stöber particles using 0.025 M NaOH in water is developed. The progress of the etching is monitored by the time dependance of the pH value. Quenching of the hydrolytic etching in ethanol is allowed to isolate mesoporous, monodisperse micrometer-sized silica particles with a pore volume of 160 μL g−1 and a pore-size range between 100 and 4 nm (>200% enhancement over the parent particle).
期刊介绍:
Advanced Engineering Materials is the membership journal of three leading European Materials Societies
- German Materials Society/DGM,
- French Materials Society/SF2M,
- Swiss Materials Federation/SVMT.