{"title":"优化的纳秒激光切割SiC晶圆:一种模拟驱动的方法(硕士论文)。抛光工艺。14/2025)","authors":"Dileep Karnam, Yu-Lung Lo","doi":"10.1002/admt.202570075","DOIUrl":null,"url":null,"abstract":"<p><b>SiC Wafers</b></p><p>In article number 2401652, Yu-Lung Lo and Dileep Karnam demonstrate the successful integration of simulation modeling and artificial neural networks to optimize nanosecond laser machining of SiC. The model accurately predicts key outputs with minimal data, reducing reliance on trial-and-error. Optimal cuts are achieved with high power and low speed, producing high aspect ratios and smooth surfaces. Plasma spectroscopy and energy-dispersive X-ray spectroscopy confirm the formation of easily removable SiC redeposits in the HAZ.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":7292,"journal":{"name":"Advanced Materials Technologies","volume":"10 14","pages":""},"PeriodicalIF":6.4000,"publicationDate":"2025-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admt.202570075","citationCount":"0","resultStr":"{\"title\":\"Optimized Nanosecond Laser Cutting of SiC Wafers: A Simulation-Driven Approach (Adv. Mater. Technol. 14/2025)\",\"authors\":\"Dileep Karnam, Yu-Lung Lo\",\"doi\":\"10.1002/admt.202570075\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><b>SiC Wafers</b></p><p>In article number 2401652, Yu-Lung Lo and Dileep Karnam demonstrate the successful integration of simulation modeling and artificial neural networks to optimize nanosecond laser machining of SiC. The model accurately predicts key outputs with minimal data, reducing reliance on trial-and-error. Optimal cuts are achieved with high power and low speed, producing high aspect ratios and smooth surfaces. Plasma spectroscopy and energy-dispersive X-ray spectroscopy confirm the formation of easily removable SiC redeposits in the HAZ.\\n\\n <figure>\\n <div><picture>\\n <source></source></picture><p></p>\\n </div>\\n </figure></p>\",\"PeriodicalId\":7292,\"journal\":{\"name\":\"Advanced Materials Technologies\",\"volume\":\"10 14\",\"pages\":\"\"},\"PeriodicalIF\":6.4000,\"publicationDate\":\"2025-07-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admt.202570075\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Materials Technologies\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/admt.202570075\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Materials Technologies","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/admt.202570075","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Optimized Nanosecond Laser Cutting of SiC Wafers: A Simulation-Driven Approach (Adv. Mater. Technol. 14/2025)
SiC Wafers
In article number 2401652, Yu-Lung Lo and Dileep Karnam demonstrate the successful integration of simulation modeling and artificial neural networks to optimize nanosecond laser machining of SiC. The model accurately predicts key outputs with minimal data, reducing reliance on trial-and-error. Optimal cuts are achieved with high power and low speed, producing high aspect ratios and smooth surfaces. Plasma spectroscopy and energy-dispersive X-ray spectroscopy confirm the formation of easily removable SiC redeposits in the HAZ.
期刊介绍:
Advanced Materials Technologies Advanced Materials Technologies is the new home for all technology-related materials applications research, with particular focus on advanced device design, fabrication and integration, as well as new technologies based on novel materials. It bridges the gap between fundamental laboratory research and industry.