半导体忆阻器中电阻开关和人工突触行为的居里-魏斯型磁场调谐

IF 18.5 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Deren Li, Wenjie He, Juan Shi, Ya Nie, Yong Peng, Xi Zhang, Gang Xiang
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引用次数: 0

摘要

磁阻特性的磁场(H)调谐是可取的,因为H是非侵入性和非破坏性的手段,可以远程应用于广泛的应用。然而,目前的研究主要集中在基于铁磁区磁性材料或非磁性材料的忆阻器,其中H对磁化强度(M)的影响很小,导致ROFF/RON比等关键忆阻参数有轻微的调谐。在顺磁区,基于磁性半导体Mn掺杂GeSe (gemse, TC = 280 K)的忆阻器中,实验证明了一种新的H调谐策略,其中居里-魏斯定律起支配作用,M随H的增加而显著增加。值得注意的是,在施加1000 Oe的H时,ROFF/RON比为106,功耗为≈1.7 × 10−8 W,分别比未施加H时高103和低103。可以在Ag/ gemse /Pt结构忆阻器中实现。详细分析表明,H调谐机制的根源是由于居里-魏斯定律(Curie-Weiss law)导致的gemse层中H诱导的突出的M和内部磁场(B)的磁耦合效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Curie–Weiss‐Type Magnetic Field Tuning of Resistive Switching and Artificial Synapse Behaviors in Semiconductor Memristor
Magnetic field (H) tuning of memristive characteristics is desirable since the H is a non‐invasive and non‐destructive means that can be remotely applied for wide applications. However, current studies mainly focus on the memristors based on magnetic materials in the ferromagnetic region or nonmagnetic materials, where the H only exerts a small influence on the strength of magnetization (M), resulting in slight tuning of the key memristive parameters such as the ROFF/RON ratio. Here, a novel strategy of H tuning is experimentally demonstrated in a memristor based on magnetic semiconductor Mn‐doped GeSe (GeMnSe, TC = 280 K) in the paramagnetic region, where the Curie–Weiss law governs and the M increases prominently with H. Notably, upon applying an H of 1000 Oe, a high ROFF/RON ratio of 106 and a low power consumption of ≈1.7 × 10−8 W, which are 103 higher and103 lower than those without applying H, respectively, can be achieved in the Ag/GeMnSe/Pt structured memristor. Moreover, the artificial synapse behaviors of the memristor are enhanced by the H. Detailed analysis shows that the H‐tuning mechanism is rooted in magnetic coupling effects originating from the H‐induced prominent M and internal magnetic field (B) in the GeMnSe layer due to the Curie–Weiss law.
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来源期刊
Advanced Functional Materials
Advanced Functional Materials 工程技术-材料科学:综合
CiteScore
29.50
自引率
4.20%
发文量
2086
审稿时长
2.1 months
期刊介绍: Firmly established as a top-tier materials science journal, Advanced Functional Materials reports breakthrough research in all aspects of materials science, including nanotechnology, chemistry, physics, and biology every week. Advanced Functional Materials is known for its rapid and fair peer review, quality content, and high impact, making it the first choice of the international materials science community.
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