4H-SiC肖特基势垒二极管场极板终端单事件烧蚀

IF 3 Q2 PHYSICS, CONDENSED MATTER
Xinfang Liao , Yintang Yang , Yi Liu
{"title":"4H-SiC肖特基势垒二极管场极板终端单事件烧蚀","authors":"Xinfang Liao ,&nbsp;Yintang Yang ,&nbsp;Yi Liu","doi":"10.1016/j.micrna.2025.208273","DOIUrl":null,"url":null,"abstract":"<div><div>This paper presents the electro-thermal coupled simulation results of single event burnout (SEB) in field plate (FP) termination for 4H–SiC Schottky barrier diodes (SBDs). The heavy ion strike at the SiC/SiO<sub>2</sub>/metal intersection is proved to be the worst case for SEB, and the catastrophic failure is related to the large current density and rapid heat accumulation at the SiC/SiO<sub>2</sub>/metal intersection, because the high electric field at this region can induce strong localized avalanche multiplication of the heavy ion-induced carriers. Then, based on the failure mechanism analysis, we discuss the possible hardening techniques. The simulations show that introducing a buffer layer between the N<sup>−</sup> epi-layer and the N<sup>+</sup> substrate can effectively reduce the sensitivity of the device to heavy ion radiation, but we have to make a compromise between the SEB tolerance and the on-state resistance. Besides, the carrier lifetime control is proved to be a promising hardening technique. When the carrier lifetime in the N<sup>−</sup> epi-layer is lower than a certain value, the SEB tolerance can be significantly improved without sacrificing the electrical performance of the device.</div></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":"207 ","pages":"Article 208273"},"PeriodicalIF":3.0000,"publicationDate":"2025-07-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Single event burnout in field plate termination for 4H–SiC Schottky barrier diodes\",\"authors\":\"Xinfang Liao ,&nbsp;Yintang Yang ,&nbsp;Yi Liu\",\"doi\":\"10.1016/j.micrna.2025.208273\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This paper presents the electro-thermal coupled simulation results of single event burnout (SEB) in field plate (FP) termination for 4H–SiC Schottky barrier diodes (SBDs). The heavy ion strike at the SiC/SiO<sub>2</sub>/metal intersection is proved to be the worst case for SEB, and the catastrophic failure is related to the large current density and rapid heat accumulation at the SiC/SiO<sub>2</sub>/metal intersection, because the high electric field at this region can induce strong localized avalanche multiplication of the heavy ion-induced carriers. Then, based on the failure mechanism analysis, we discuss the possible hardening techniques. The simulations show that introducing a buffer layer between the N<sup>−</sup> epi-layer and the N<sup>+</sup> substrate can effectively reduce the sensitivity of the device to heavy ion radiation, but we have to make a compromise between the SEB tolerance and the on-state resistance. Besides, the carrier lifetime control is proved to be a promising hardening technique. When the carrier lifetime in the N<sup>−</sup> epi-layer is lower than a certain value, the SEB tolerance can be significantly improved without sacrificing the electrical performance of the device.</div></div>\",\"PeriodicalId\":100923,\"journal\":{\"name\":\"Micro and Nanostructures\",\"volume\":\"207 \",\"pages\":\"Article 208273\"},\"PeriodicalIF\":3.0000,\"publicationDate\":\"2025-07-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Micro and Nanostructures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S277301232500202X\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micro and Nanostructures","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S277301232500202X","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0

摘要

本文给出了4H-SiC肖特基势垒二极管(sdd)场极板端部单事件烧坏(SEB)的电热耦合模拟结果。在SiC/SiO2/金属交接处重离子撞击是SEB的最坏情况,其灾难性破坏与SiC/SiO2/金属交接处的大电流密度和快速热积累有关,因为该区域的高电场可以诱导重离子诱导载流子的强局域雪崩倍增。然后,在分析失效机理的基础上,讨论了可能的硬化技术。仿真结果表明,在N -外延层和N+衬底之间引入缓冲层可以有效降低器件对重离子辐射的灵敏度,但必须在SEB容限和导通电阻之间做出折衷。此外,载体寿命控制是一种很有前途的硬化技术。当N−外延层中的载流子寿命低于某一值时,可以在不牺牲器件电气性能的情况下显著提高SEB容差。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Single event burnout in field plate termination for 4H–SiC Schottky barrier diodes
This paper presents the electro-thermal coupled simulation results of single event burnout (SEB) in field plate (FP) termination for 4H–SiC Schottky barrier diodes (SBDs). The heavy ion strike at the SiC/SiO2/metal intersection is proved to be the worst case for SEB, and the catastrophic failure is related to the large current density and rapid heat accumulation at the SiC/SiO2/metal intersection, because the high electric field at this region can induce strong localized avalanche multiplication of the heavy ion-induced carriers. Then, based on the failure mechanism analysis, we discuss the possible hardening techniques. The simulations show that introducing a buffer layer between the N epi-layer and the N+ substrate can effectively reduce the sensitivity of the device to heavy ion radiation, but we have to make a compromise between the SEB tolerance and the on-state resistance. Besides, the carrier lifetime control is proved to be a promising hardening technique. When the carrier lifetime in the N epi-layer is lower than a certain value, the SEB tolerance can be significantly improved without sacrificing the electrical performance of the device.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
6.50
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信