柔性卷材连续包覆新型反应器的真空技术研究

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-07-14 DOI:10.1016/j.vacuum.2025.114579

Philipp Alizadeh, Rainer Dahlmann

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引用次数: 0

摘要

本文介绍了一种用于等离子体增强化学气相沉积（PECVD）柔性卷材在线涂层的真空反应器的概念和验证。三个气闸被使用，以确保膜不间断地运输进出一个持续疏散的反应堆。四个不同的压力区域由各自的传感器监测。实现了压差，这是将等离子体激发和涂层沉积最小化的先决条件。该研究强调了泄漏流动动力学，大约70%归因于抽油机1,29%归因于抽油机2，只有1%归因于涂层模块。反应堆的结构通过“节流短路”有效地减少了区域之间的压力均衡。讨论了气闸和过程包壳的电导值，并建议进行几何调整以改善气流堵塞。观察到工艺包壳内的基本压力（不含工艺气体）为4.9 Pa，使得PECVD的压力大于15 Pa。

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Vacuum technical investigation of a novel reactor for the continuous coating of flexible web material

This short communication presents the concept and validation of a vacuum reactor designed for Plasma-Enhanced Chemical Vapor Deposition (PECVD) inline coating of flexible web material. Three airlocks are utilized in order to ensure uninterrupted transportation of the film in and out of a consistently evacuated reactor. Four distinct pressure areas are monitored by respective sensors. Pressure differentials were achieved, which are a prerequisite for minimizing plasma excitation and coating deposition outside the process envelope.

The study highlights leakage flow dynamics, with approximately 70 % attributed to Pumping Unit I, 29 % to Pumping Unit II, and only 1 % to the coating module. The reactor's configuration effectively reduces pressure equalization between zones by "throttled short-circuits". Conductance values for the airlocks and process envelope are discussed, with geometric adjustments recommended for improved flow choking. A base pressure (without process gases) of 4.9 Pa in the process envelope was observed, enabling PECVD at pressures greater than 15 Pa.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.