激光烧蚀制备具有光学质量的玻璃表面微结构的途径。

IF 3.9 2区综合性期刊 Q1 MULTIDISCIPLINARY SCIENCES

Scientific Reports Pub Date : 2025-07-14 DOI:10.1038/s41598-025-11563-0

Dominika Schrödter, Patryk Mietliński, Bartosz Gapiński, Andreas Dietzel

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引用次数: 0

摘要

玻璃基板因其透明度，稳定性和生物相容性而受到高度重视，使其在光学，光子学，化学和生物医学设备中必不可少。飞秒激光器能够提供高能量密度的脉冲，导致非线性吸收，从而实现精确的玻璃烧蚀。本研究考察了脉冲能量、扫描线密度和脉冲重复率等参数对三维硼硅玻璃结构表面粗糙度的影响。通过AFM，µCT和SEM的分析揭示了参数设置，以尽量减少粗糙度和防止衬底损坏。后处理，如HF蚀刻和退火，进一步提高了表面质量，产生光滑，透明（T = 85.35%）的微结构，特别是用于新型光学和光流体应用。

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The route to microstructures with optical quality glass surfaces by fs laser ablation.

Glass substrates are highly valued for their transparency, stability and biocompatibility, making them essential in optics, photonics, chemistry and biomedical devices. Femtosecond lasers enable precise glass ablation due to the capability to deliver pulses with high energy density leading to nonlinear absorption. This study examined how parameters like pulse energy, scan line density and pulse repetition rate affect the surface roughness of 3D borosilicate glass structures. Analysis by means of AFM, µCT and SEM revealed parameter settings to minimize roughness and prevent substrate damage. Post-treatments like HF etching and annealing further enhanced surface quality, resulting in smooth, transparent (T = 85.35%) microstructures especially for novel optical and optofluidic applications.

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来源期刊

Scientific Reports Natural Science Disciplines-

CiteScore

7.50

自引率

4.30%

发文量

19567

审稿时长

3.9 months

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