一种8T SRAM单元,用于具有动态体偏置的高速亚阈值操作

IF 2.2 3区 工程技术 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE
Anshumat Dinesh , Yogita Chopra , Poornima Mittal
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引用次数: 0

摘要

本文提出了一种基于传输门的8T SRAM单元,具有动态体偏置,具有无snm读端口。存储核心使用5个晶体管(4个用于交叉耦合逆变器,1个用于反馈控制)。该设计在27°C-75°C范围内具有一致的保持静态噪声裕度(HSNM)和读取静态噪声裕度(RSNM),而写入裕度(WM)在温度达到75°C之前呈线性增加,然后略有下降。n曲线指标(svm、SINM、WTV和WTI)揭示了稳定性趋势:svm /SINM反映HSNM/RSNM, WTV随温度升高而提高,WTI降低。电流参数与电源电压呈指数关系,而WTV和WM则呈线性关系。功耗在测试温度范围内保持稳定,但随着电源电压的升高而急剧上升。在较高电压下,写入延迟显著降低。该单元采用动态阈值MOS (DTMOS)逻辑,提高了写入速度(比同类设计快52%),平均写入延迟为14.9 ns(“0”为7.35 ns)。由于dmos驱动的电流,这种速度的提高带来了更高的功率,写入功率比其他电池的平均功率高4.3倍。读取功率正好等于其他电池的平均值,为1.47 nW,静态功率略高于其他电池的平均功率。该设计提供了与其他测试单元一致的稳定性,超过了读取操作期间对电流噪声的抗扰性。紧凑的布局面积为1.68 μm2,小于几种同类布局。该设计在速度方面进行了优化,同时具有稳定性和布局面积,符合其他电池的平均水平,电池的功耗是该设计与其他电池相比表现出明显劣势的属性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An 8T SRAM cell for high-speed sub-threshold operation with dynamic body biasing
This paper presents a Transmission Gate based 8T SRAM cell with dynamic body biasing, featuring a SNM-free read port. The memory core uses 5 transistors (4 for cross-coupled inverters and 1 for feedback control). The design demonstrates consistent Hold Static Noise Margin (HSNM) and Read Static Noise Margin (RSNM) across 27°C-75°C, while the write margin (WM) increases linearly with temperature up to 75°C before a slight decline. N-curve metrics—SVNM, SINM, WTV, and WTI—reveal stability trends: SVNM/SINM mirror HSNM/RSNM, WTV improves with temperature, and WTI degrades. Current parameters scale exponentially with supply voltage, whereas WTV and WM show linear voltage dependence. Power consumption remains stable across the tested temperature range but rises sharply with supply voltage. Write delay reduces significantly at higher voltages. The cell employs Dynamic Threshold MOS (DTMOS) logic, enhancing write speed (52 % faster than comparable designs) with an average write delay of 14.9 ns (7.35 ns for ‘0’). This speed improvement incurs higher power due to DTMOS-driven currents, with the write power being 4.3 times higher than the average of the other cells. The read power, however, is exactly equal to the average value of the other cells being at 1.47 nW, and static power is slightly higher than the average power of the other cells. The design provides stability in line with other cells tested, exceeding the immunity to current noise during read operations. The compact layout occupies 1.68 μm2, smaller than several counterparts. The Design is optimized for speed while having stability and layout area in accordance with the average of the other cells, the power consumption of the cell is the attribute in which the design shows a strikingly inferior performance when compared to other cells.
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来源期刊
Integration-The Vlsi Journal
Integration-The Vlsi Journal 工程技术-工程:电子与电气
CiteScore
3.80
自引率
5.30%
发文量
107
审稿时长
6 months
期刊介绍: Integration''s aim is to cover every aspect of the VLSI area, with an emphasis on cross-fertilization between various fields of science, and the design, verification, test and applications of integrated circuits and systems, as well as closely related topics in process and device technologies. Individual issues will feature peer-reviewed tutorials and articles as well as reviews of recent publications. The intended coverage of the journal can be assessed by examining the following (non-exclusive) list of topics: Specification methods and languages; Analog/Digital Integrated Circuits and Systems; VLSI architectures; Algorithms, methods and tools for modeling, simulation, synthesis and verification of integrated circuits and systems of any complexity; Embedded systems; High-level synthesis for VLSI systems; Logic synthesis and finite automata; Testing, design-for-test and test generation algorithms; Physical design; Formal verification; Algorithms implemented in VLSI systems; Systems engineering; Heterogeneous systems.
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