用于太阳热吸收的直流溅射WTi纳米颗粒:合成和表征

Abbas AL-Rjoub
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引用次数: 0

摘要

提出了一种在室温等离子体气凝簇源下用直流磁控溅射法制备钨钛纳米颗粒的方法。在优化纳米颗粒形成条件后,通过扫描电子显微镜(SEM)、x射线能谱(EDS)、x射线衍射(XRD)和透射电子显微镜(TEM)对样品进行了广泛的表征。在分压为14 SCCM的条件下制备的纳米颗粒,在Si上形成厚层的合成速率为241 nm/min。在CF 400-Cu网格上沉积的纳米颗粒直径在30 ~ 55 nm之间。纳米颗粒的形态以枝晶、花状结构为特征,在不同大小的颗粒中观察到明显的团聚。TEM和XRD分析证实了纳米颗粒的结晶结构,主要为α-W相。在SiAlOx层中嵌入的WTi纳米颗粒电流密度在2.6 mA/cm²到7.8 mA/cm²之间变化,为定制光学应用提供了宽范围的透射率(T)和反射率(R)值,具有特定的光学常数折射率(n)和消光系数(k),能够模拟吸收率(α)为96.0 %的太阳热吸收剂。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
DC sputtered WTi nanoparticles for solar thermal absorption: Synthesis and characterization
This study presents a method for tungsten-titanium (WTi) nanoparticles synthesis by DC-magnetron sputtering in a plasma gas condensation cluster-source at room temperature. After optimizing the conditions for nanoparticles formation, the samples were extensively characterized through Scanning-Electron Microscopy (SEM), Energy Dispersive X-Ray Spectroscopy (EDS), X-ray Diffraction (XRD), and Transmission-Electron Microscopy (TEM). For nanoparticles produced under a partial Ar pressure of 14 SCCM, the synthesis rate for thick layer on Si is 241 nm/min. The diameters of nanoparticles deposited on CF 400-Cu grids ranged from 30 nm to 55 nm. The morphology of the nanoparticles is distinguished by a dendritic, flower-like structure, with significant agglomeration observed in particles of varying sizes. TEM and XRD analysis confirm that the nanoparticles exhibit a crystalline-structure, predominantly in the α-W phase. The embedded WTi nanoparticles in SiAlOx layer with variation in current density from 2.6 mA/cm² to 7.8 mA/cm² provide a wide range of transmittance (T) and reflectance (R) values with specific optical constants refractive index (n) and extinction coefficient (k) for tailored optical applications, capable to simulate a solar thermal absorber with absorptance (α) of 96.0 %.
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