范德华间隙工程人工晶体:可调物理特性和新兴器件应用的平台。

IF 16 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
ACS Nano Pub Date : 2025-07-11 DOI:10.1021/acsnano.5c07172
Jinhong Min, Jihyun Kim, Sang Min Won* and Joohoon Kang*, 
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引用次数: 0

摘要

人工晶体由人工组装的二维原子层组成,代表了一个多功能平台,可以超越自然发生的层状系统的限制,定制材料特性。可扩展制造技术的发展加速了它们在电子学、光电子学和量子器件中的实际应用。除了组装策略,相邻层之间的范德华间隙(vdWG)的精确调制已被认为是定制人工晶体基本特性的关键方法。vdWG工程──通过插层、机械压缩和化学功能化等方法实现──能够系统地调整层间耦合、能带对准、电荷输运、激子行为和结构相位。这些进展为将vdwg工程人工晶体集成到高性能晶体管、光电探测器、超导器件和自旋电子平台中提供了一个通用的基础。从这个角度来看,我们全面研究了人造晶体的制造方法,并对现有的vdWG工程策略进行了分类。然后,讨论了控制层间距对材料性能的影响。研究了它们在下一代技术应用中的潜力,同时解决了关键挑战,以充分实现vdwg工程人工晶体在实际设备应用中的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

van der Waals Gap-Engineered Artificial Crystals: A Platform for Tunable Physical Properties and Emerging Device Applications

van der Waals Gap-Engineered Artificial Crystals: A Platform for Tunable Physical Properties and Emerging Device Applications

Artificial crystals, composed of artificially assembled 2D atomic layers, represent a versatile platform for tailoring material properties beyond the limitations of naturally occurring layered systems. The development of scalable fabrication techniques has accelerated their transition toward practical applications in electronics, optoelectronics, and quantum devices. Beyond assembly strategies, the precise modulation of the van der Waals gap (vdWG) between adjacent layers has been recognized as a critical approach for tailoring the fundamental properties of artificial crystals. vdWG engineering─achieved through methods such as intercalation, mechanical compression, and chemical functionalization─enables systematic tuning of interlayer coupling, band alignment, charge transport, excitonic behavior, and structural phase. These advances provide a versatile foundation for integrating vdWG-engineered artificial crystals into high-performance transistors, photodetectors, superconducting devices, and spintronic platforms. In this perspective, we comprehensively examine fabrication methodologies for artificial crystals and categorize existing vdWG engineering strategies. Then, the discussion expands to the influences of the controlled interlayer spacing toward material properties. Their potential for next-generation technological applications is examined while addressing critical challenges to fully realize the potential of vdWG-engineered artificial crystals in real-world device applications.

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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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