T. Hankins , A.B. McIntosh , K. Hagel , A.D. Abbott , A. Alvarez , R. Bartsch , M. McClure , S. Regener , M.Q. Sorensen , S.J. Yennello
{"title":"用电阻硅探测器绘制薄箔的厚度和均匀性","authors":"T. Hankins , A.B. McIntosh , K. Hagel , A.D. Abbott , A. Alvarez , R. Bartsch , M. McClure , S. Regener , M.Q. Sorensen , S.J. Yennello","doi":"10.1016/j.nimb.2025.165788","DOIUrl":null,"url":null,"abstract":"<div><div>Alpha energy loss is a common tool used for measuring target thicknesses. However, these measurements are often made without position information, which either forfeits knowledge of material uniformity and local thickness or requires a prohibitive number of measurements per target to partially recover this information. In consideration of this, a method for measuring position-dependent thicknesses is described in this work; by using the position-sensitivity of the dual-axis duo-lateral (DADL) silicon detector, thicknesses across the entire face of the material can be measured to sub-mm precision with a single measurement. Several examples are presented using a number of targets with varying characteristics, which altogether demonstrate the precision, accuracy, and versatility of this technique.</div></div>","PeriodicalId":19380,"journal":{"name":"Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms","volume":"566 ","pages":"Article 165788"},"PeriodicalIF":1.4000,"publicationDate":"2025-07-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thickness and uniformity mapping of thin foils using resistive silicon detectors\",\"authors\":\"T. Hankins , A.B. McIntosh , K. Hagel , A.D. Abbott , A. Alvarez , R. Bartsch , M. McClure , S. Regener , M.Q. Sorensen , S.J. Yennello\",\"doi\":\"10.1016/j.nimb.2025.165788\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Alpha energy loss is a common tool used for measuring target thicknesses. However, these measurements are often made without position information, which either forfeits knowledge of material uniformity and local thickness or requires a prohibitive number of measurements per target to partially recover this information. In consideration of this, a method for measuring position-dependent thicknesses is described in this work; by using the position-sensitivity of the dual-axis duo-lateral (DADL) silicon detector, thicknesses across the entire face of the material can be measured to sub-mm precision with a single measurement. Several examples are presented using a number of targets with varying characteristics, which altogether demonstrate the precision, accuracy, and versatility of this technique.</div></div>\",\"PeriodicalId\":19380,\"journal\":{\"name\":\"Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms\",\"volume\":\"566 \",\"pages\":\"Article 165788\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2025-07-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0168583X25001788\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"INSTRUMENTS & INSTRUMENTATION\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0168583X25001788","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}
Thickness and uniformity mapping of thin foils using resistive silicon detectors
Alpha energy loss is a common tool used for measuring target thicknesses. However, these measurements are often made without position information, which either forfeits knowledge of material uniformity and local thickness or requires a prohibitive number of measurements per target to partially recover this information. In consideration of this, a method for measuring position-dependent thicknesses is described in this work; by using the position-sensitivity of the dual-axis duo-lateral (DADL) silicon detector, thicknesses across the entire face of the material can be measured to sub-mm precision with a single measurement. Several examples are presented using a number of targets with varying characteristics, which altogether demonstrate the precision, accuracy, and versatility of this technique.
期刊介绍:
Section B of Nuclear Instruments and Methods in Physics Research covers all aspects of the interaction of energetic beams with atoms, molecules and aggregate forms of matter. This includes ion beam analysis and ion beam modification of materials as well as basic data of importance for these studies. Topics of general interest include: atomic collisions in solids, particle channelling, all aspects of collision cascades, the modification of materials by energetic beams, ion implantation, irradiation - induced changes in materials, the physics and chemistry of beam interactions and the analysis of materials by all forms of energetic radiation. Modification by ion, laser and electron beams for the study of electronic materials, metals, ceramics, insulators, polymers and other important and new materials systems are included. Related studies, such as the application of ion beam analysis to biological, archaeological and geological samples as well as applications to solve problems in planetary science are also welcome. Energetic beams of interest include atomic and molecular ions, neutrons, positrons and muons, plasmas directed at surfaces, electron and photon beams, including laser treated surfaces and studies of solids by photon radiation from rotating anodes, synchrotrons, etc. In addition, the interaction between various forms of radiation and radiation-induced deposition processes are relevant.