Lixia Yang , Zhuocheng Wei , Jingjing Wu , Yuanqiang Xiao , Mingcan Cao , Qu-ao Li , Jun-e Qu , JunXia Wang
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A simple silanization pretreatment to effectively inhibit the lateral growth of nickel electrodeposits for multilayer chip inductors
The lateral growth of nickel electrodeposits on ferrite surfaces of multilayer chip inductors (MLCI) is a key problem for the preparation of Ag/Ni/Sn terminal electrode in barrel plating, especially in acidic bath under high current density. Simple silanization is tentatively used to the pretreatment of MLCI aiming at inhibiting the lateral growth of nickel, the inhibiting effect and its influence on the electrodeposition behavior and welding performance are investigated. The hydrolyzed γ-GPS and BTSE are selectively adsorbed on the ferrite surfaces, and the optimized formulation is determined. The industrial field experiments prove that the lateral growth ratio (Rlg) dramatically decreases from 41.29% to 0 after silanization, and that nickel electrodeposits increases from 1.4 to 2.0 μm with good welding performance.
期刊介绍:
Materials Letters has an open access mirror journal Materials Letters: X, sharing the same aims and scope, editorial team, submission system and rigorous peer review.
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