Ar+注入诱导的rf溅射ZnO薄膜裁剪:结构、形态和光学性质。

IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Beilstein Journal of Nanotechnology Pub Date : 2025-06-11 eCollection Date: 2025-01-01 DOI:10.3762/bjnano.16.66
Manu Bura, Divya Gupta, Arun Kumar, Sanjeev Aggarwal
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引用次数: 0

摘要

将30 keV的Ar+离子注入到射频溅射氧化锌薄膜中,其影响范围为1 × 1015 ~ 2 × 1016离子·cm-2。拉曼光谱显示在原始和注入ZnO薄膜中存在E2(低)、E2(高)和A1 (LO)拉曼模式。随着离子影响的增加,E2(高)和A1(低)拉曼模式的峰值强度分别逐渐下降和上升。然而,E2(低)模式变宽,并在更高的影响下与无序引起的宽带完全合并。此外,A1 (LO)拉曼峰的反卷积证实了植入样品中存在与缺陷相关的拉曼模式。在掠射入射角x射线衍射图中观察到,随着离子影响的增加,注入ZnO薄膜的结晶度逐渐降低。原子力显微镜图像显示,注入后膜的晶粒尺寸减小,表面粗糙度值下降。植入引起的结构改变进一步与漫反射、乌尔巴赫能量和光带隙的变化相关。植入膜的低反射率值保证了其适合作为透明窗口和各种光电器件的抗反射涂层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ar+ implantation-induced tailoring of RF-sputtered ZnO films: structural, morphological, and optical properties.

Radio frequency-sputtered zinc oxide films are implanted with 30 keV Ar+ ions at various fluences ranging from 1 × 1015 to 2 × 1016 ions·cm-2. Raman spectra reveal the presence of the E2 (low), E2 (high), and A1 (LO) Raman modes in pristine and implanted ZnO films. A gradual fall and rise in peak intensity of, respectively, the E2 (high) and A1 (LO) Raman modes is observed with increases in ion fluence. However, the E2 (low) mode broadens and merges completely with disorder-induced broad band at higher fluences. Moreover, the deconvolution of the A1 (LO) Raman peak affirms the presence of defect-related Raman modes in the implanted samples. A gradual reduction in crystallinity of the implanted ZnO films with increasing ion fluence is observed in grazing incidence angle X-ray diffraction patterns. Atomic force microscopy images show grain size reduction and a fall in the surface roughness value of films after implantation. The implantation-induced structural modifications are further correlated with the variation in diffuse reflectance, Urbach energy, and optical bandgap. The low reflectance values of implanted films assure their suitability as transparent windows and anti-reflective coating in various optoelectronic devices.

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来源期刊
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.70
自引率
3.20%
发文量
109
审稿时长
2 months
期刊介绍: The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.
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