平面双燃烧光栅灰度电子束光刻工艺的优化与控制

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-06-24 DOI:10.1016/j.vacuum.2025.114540

Liang Liu , Xiaodong Zhang , Jingyuan Zhu , Siyu Dong , Zeyong Wei , Zhanshan Wang , Xinbin Cheng

{"title":"平面双燃烧光栅灰度电子束光刻工艺的优化与控制","authors":"Liang Liu , Xiaodong Zhang , Jingyuan Zhu , Siyu Dong , Zeyong Wei , Zhanshan Wang , Xinbin Cheng","doi":"10.1016/j.vacuum.2025.114540","DOIUrl":null,"url":null,"abstract":"<div><div>The blazed grating is a commonly used spectral component in spectroscopic imaging systems, but its operating bandwidth is limited by diffraction efficiency. Dual-blazed gratings, with varying blazed angles in different regions, offer a solution for wider bandwidth. However, fabricating such gratings faces the challenges in processing different angles and matching wavefronts. Grayscale electron beam lithography (g-EBL) presents a flexible method for manufacturing dual-blazed gratings with high efficiency and precise wavefronts compared to other techniques. Despite its advantages, the detailed process remains underdiscussed. This paper outlines a detailed g-EBL process for creating planar dual-blazed gratings. By optimizing grating layout and exposure doses, two blazed-angle gratings (1.8° and 3.5°) were accurately produced with consistent alignment in center height. The resulting dual-blazed grating exhibited 53 % average diffraction efficiency in 0.4–1.05 μm and less than 0.2 wv Peak-to-Valley wavefront aberration. This method establishes a universal approach for crafting dual-blazed gratings using g-EBL techniques.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114540"},"PeriodicalIF":3.9000,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimizing and well-Controlled Grayscale Electron Beam lithography for planar dual-blazed grating fabrication\",\"authors\":\"Liang Liu , Xiaodong Zhang , Jingyuan Zhu , Siyu Dong , Zeyong Wei , Zhanshan Wang , Xinbin Cheng\",\"doi\":\"10.1016/j.vacuum.2025.114540\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>The blazed grating is a commonly used spectral component in spectroscopic imaging systems, but its operating bandwidth is limited by diffraction efficiency. Dual-blazed gratings, with varying blazed angles in different regions, offer a solution for wider bandwidth. However, fabricating such gratings faces the challenges in processing different angles and matching wavefronts. Grayscale electron beam lithography (g-EBL) presents a flexible method for manufacturing dual-blazed gratings with high efficiency and precise wavefronts compared to other techniques. Despite its advantages, the detailed process remains underdiscussed. This paper outlines a detailed g-EBL process for creating planar dual-blazed gratings. By optimizing grating layout and exposure doses, two blazed-angle gratings (1.8° and 3.5°) were accurately produced with consistent alignment in center height. The resulting dual-blazed grating exhibited 53 % average diffraction efficiency in 0.4–1.05 μm and less than 0.2 wv Peak-to-Valley wavefront aberration. This method establishes a universal approach for crafting dual-blazed gratings using g-EBL techniques.</div></div>\",\"PeriodicalId\":23559,\"journal\":{\"name\":\"Vacuum\",\"volume\":\"240 \",\"pages\":\"Article 114540\"},\"PeriodicalIF\":3.9000,\"publicationDate\":\"2025-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vacuum\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0042207X25005305\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25005305","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

摘要

燃烧光栅是光谱成像系统中常用的光谱元件，但其工作带宽受衍射效率的限制。双燃烧光栅在不同区域具有不同的燃烧角度，为更宽的带宽提供了解决方案。然而，制作这种光栅面临着处理不同角度和匹配波前的挑战。与其他技术相比，灰度电子束光刻（g-EBL）提供了一种灵活的制造双火焰光栅的方法，具有高效率和精确的波前。尽管有其优点，但详细的过程仍未得到充分讨论。本文概述了创建平面双燃烧光栅的详细g-EBL过程。通过优化光栅布局和曝光剂量，可以精确地生成两个燃烧角光栅（1.8°和3.5°），且中心高度对齐一致。所得双燃烧光栅在0.4 ~ 1.05 μm范围内的平均衍射效率为53%，峰谷像差小于0.2 wv。这种方法建立了一种通用的方法来制作双燃烧光栅使用g-EBL技术。

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Optimizing and well-Controlled Grayscale Electron Beam lithography for planar dual-blazed grating fabrication

The blazed grating is a commonly used spectral component in spectroscopic imaging systems, but its operating bandwidth is limited by diffraction efficiency. Dual-blazed gratings, with varying blazed angles in different regions, offer a solution for wider bandwidth. However, fabricating such gratings faces the challenges in processing different angles and matching wavefronts. Grayscale electron beam lithography (g-EBL) presents a flexible method for manufacturing dual-blazed gratings with high efficiency and precise wavefronts compared to other techniques. Despite its advantages, the detailed process remains underdiscussed. This paper outlines a detailed g-EBL process for creating planar dual-blazed gratings. By optimizing grating layout and exposure doses, two blazed-angle gratings (1.8° and 3.5°) were accurately produced with consistent alignment in center height. The resulting dual-blazed grating exhibited 53 % average diffraction efficiency in 0.4–1.05 μm and less than 0.2 wv Peak-to-Valley wavefront aberration. This method establishes a universal approach for crafting dual-blazed gratings using g-EBL techniques.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.