{"title":"基于新型SpacerX工艺的固态纳米孔阵列的晶圆级制造。","authors":"Lihuan Zhao, Jiajun Wang, Lin-Sheng Wu, Xin Zhao","doi":"10.1038/s41378-025-00979-3","DOIUrl":null,"url":null,"abstract":"<p><p>Solid-state nanopores (SSNPs) have emerged as a transformative platform in nanotechnology and biotechnology, yet their application is limited by the lack of cost-effective, reproducible fabrication technology. Here, we introduce a novel SpacerX process for wafer-scale fabrication of well-ordered nanopore arrays inspired by spacer patterning used in the standard semiconductor manufacturing process. This technique is intrinsically scalable and features tunable nanopore dimensions, with an open-pore rate exceeding 99.9%, even in an academic cleanroom. We successfully demonstrated a silicon nitride (Si<sub>3</sub>N<sub>4</sub>) nanopore array with a diameter of ~30 nm, non-uniformity below 10%, and spacing of 10 μm. By further reducing the spacer size, the nanopore diameter can be minimized to 10 nm. We fabricated multi-pore devices and showed that dual-pore devices offer higher detection throughput for DNA molecules. The SpacerX process only involves two ultraviolet lithography steps with one mask, and can be readily adopted by commercial foundries, thus opening the possibility of mass-producing sub-10 nm SSNPs at extremely low cost.</p>","PeriodicalId":18560,"journal":{"name":"Microsystems & Nanoengineering","volume":"11 1","pages":"129"},"PeriodicalIF":7.3000,"publicationDate":"2025-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12187910/pdf/","citationCount":"0","resultStr":"{\"title\":\"Wafer-scale fabrication of solid-state nanopore array with a novel SpacerX process.\",\"authors\":\"Lihuan Zhao, Jiajun Wang, Lin-Sheng Wu, Xin Zhao\",\"doi\":\"10.1038/s41378-025-00979-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><p>Solid-state nanopores (SSNPs) have emerged as a transformative platform in nanotechnology and biotechnology, yet their application is limited by the lack of cost-effective, reproducible fabrication technology. Here, we introduce a novel SpacerX process for wafer-scale fabrication of well-ordered nanopore arrays inspired by spacer patterning used in the standard semiconductor manufacturing process. This technique is intrinsically scalable and features tunable nanopore dimensions, with an open-pore rate exceeding 99.9%, even in an academic cleanroom. We successfully demonstrated a silicon nitride (Si<sub>3</sub>N<sub>4</sub>) nanopore array with a diameter of ~30 nm, non-uniformity below 10%, and spacing of 10 μm. By further reducing the spacer size, the nanopore diameter can be minimized to 10 nm. We fabricated multi-pore devices and showed that dual-pore devices offer higher detection throughput for DNA molecules. The SpacerX process only involves two ultraviolet lithography steps with one mask, and can be readily adopted by commercial foundries, thus opening the possibility of mass-producing sub-10 nm SSNPs at extremely low cost.</p>\",\"PeriodicalId\":18560,\"journal\":{\"name\":\"Microsystems & Nanoengineering\",\"volume\":\"11 1\",\"pages\":\"129\"},\"PeriodicalIF\":7.3000,\"publicationDate\":\"2025-06-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC12187910/pdf/\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microsystems & Nanoengineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1038/s41378-025-00979-3\",\"RegionNum\":1,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"INSTRUMENTS & INSTRUMENTATION\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microsystems & Nanoengineering","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1038/s41378-025-00979-3","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}
Wafer-scale fabrication of solid-state nanopore array with a novel SpacerX process.
Solid-state nanopores (SSNPs) have emerged as a transformative platform in nanotechnology and biotechnology, yet their application is limited by the lack of cost-effective, reproducible fabrication technology. Here, we introduce a novel SpacerX process for wafer-scale fabrication of well-ordered nanopore arrays inspired by spacer patterning used in the standard semiconductor manufacturing process. This technique is intrinsically scalable and features tunable nanopore dimensions, with an open-pore rate exceeding 99.9%, even in an academic cleanroom. We successfully demonstrated a silicon nitride (Si3N4) nanopore array with a diameter of ~30 nm, non-uniformity below 10%, and spacing of 10 μm. By further reducing the spacer size, the nanopore diameter can be minimized to 10 nm. We fabricated multi-pore devices and showed that dual-pore devices offer higher detection throughput for DNA molecules. The SpacerX process only involves two ultraviolet lithography steps with one mask, and can be readily adopted by commercial foundries, thus opening the possibility of mass-producing sub-10 nm SSNPs at extremely low cost.
期刊介绍:
Microsystems & Nanoengineering is a comprehensive online journal that focuses on the field of Micro and Nano Electro Mechanical Systems (MEMS and NEMS). It provides a platform for researchers to share their original research findings and review articles in this area. The journal covers a wide range of topics, from fundamental research to practical applications. Published by Springer Nature, in collaboration with the Aerospace Information Research Institute, Chinese Academy of Sciences, and with the support of the State Key Laboratory of Transducer Technology, it is an esteemed publication in the field. As an open access journal, it offers free access to its content, allowing readers from around the world to benefit from the latest developments in MEMS and NEMS.