电触发真空表面闪络开关导通电阻特性研究

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-06-23 DOI:10.1016/j.vacuum.2025.114531

Yingjie Fu , Bingyang Feng , Mingtian Ye , Luokang Dong , Shenyi Qin , Zhengzheng Liu , Mengbing He

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引用次数: 0

摘要

电触发真空表面闪络开关（VSFS）具有高速传导、快速绝缘恢复、体积紧凑、结构简单等优点，非常适合于高压和大功率转换应用。导通电阻作为脉冲电源系统的一个重要参数，直接影响脉冲电源系统的输出效率和寿命。本文提出了一种VSFS导通电阻的理论模型，并研究了通道发育的不同阶段对导通电阻的影响。具体来说，它涵盖了三个不同发育阶段的通道扩张和通道电阻率下降，真空通道的建立，真空通道的电阻崩溃和导通状态。理论模型表明，增加工作电压可以有效地扩大沟道宽度，导通状态下的沟道电压与沟道电阻率呈负相关。最后，利用实验波形计算了vfs在方波和指数衰减条件下的导态电阻变化趋势，实验结果与理论分析相吻合。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Characterization of on-state resistance of electrically-triggered vacuum surface flashover switch

The electrically triggered vacuum surface flashover switch (VSFS) has the advantages of high-speed conduction, fast insulation recovery, compact size, and simple construction, making it well-suited for high voltage and high-power conversion applications. The on-state resistance, as a critical parameter of the VSFS, directly influences the output efficiency and lifetime of the pulse power system. In this paper, a theoretical model of the VSFS on-state resistance is proposed, and the effect of different phases of channel development on the on-state resistance is also investigated. Specifically, it covers the channel expansion and channel resistivity decline during three distinct developmental phases, the establishment of vacuum-stream channel, the resistance collapse of vacuum-stream channel, and the on state. The theoretical model demonstrates that increasing the operating voltage can effectively expand the channel width, and the channel voltage in the on-state is negative to the channel resistivity. Finally, the variation trend of the VSFS on-state resistance under square wave and exponential decay conditions was calculated using experimental waveforms, and the experimental results are consistent with the theoretical analysis.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.