{"title":"两种不同图案衬底上InAs阵列纳米线生长机理的研究","authors":"Xiaoye Wang , Xiaoguang Yang , Tao Yang","doi":"10.1016/j.vacuum.2025.114539","DOIUrl":null,"url":null,"abstract":"<div><div>Si/SiO<sub>2</sub> patterned substrates are usually employed to assist the positioning growth of array nanowires, but the detailed growth mechanism has not been thoroughly investigated. In this work, two completely different methods were adopted to fabricate Si/SiO<sub>2</sub> patterned substrates, and the InAs array nanowires grown on them via MOCVD presented some distinct growth results. By deeply analyzing the different processes and structures of the two methods for preparing patterned substrates, the different growth mechanisms of the two array nanowires were studied. Moreover, the method of preparing Si/SiO<sub>2</sub> patterned substrates using Si<sub>3</sub>N<sub>4</sub> as a transition layer can further reduce the diameter of naonholes and solve the problem that the diameter of nanoholes of the Si/SiO<sub>2</sub> patterned substrates prepared by the traditional method is difficult to be further reduced.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114539"},"PeriodicalIF":3.8000,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study on growth mechanism of InAs array nanowires on two different patterned substrates\",\"authors\":\"Xiaoye Wang , Xiaoguang Yang , Tao Yang\",\"doi\":\"10.1016/j.vacuum.2025.114539\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Si/SiO<sub>2</sub> patterned substrates are usually employed to assist the positioning growth of array nanowires, but the detailed growth mechanism has not been thoroughly investigated. In this work, two completely different methods were adopted to fabricate Si/SiO<sub>2</sub> patterned substrates, and the InAs array nanowires grown on them via MOCVD presented some distinct growth results. By deeply analyzing the different processes and structures of the two methods for preparing patterned substrates, the different growth mechanisms of the two array nanowires were studied. Moreover, the method of preparing Si/SiO<sub>2</sub> patterned substrates using Si<sub>3</sub>N<sub>4</sub> as a transition layer can further reduce the diameter of naonholes and solve the problem that the diameter of nanoholes of the Si/SiO<sub>2</sub> patterned substrates prepared by the traditional method is difficult to be further reduced.</div></div>\",\"PeriodicalId\":23559,\"journal\":{\"name\":\"Vacuum\",\"volume\":\"240 \",\"pages\":\"Article 114539\"},\"PeriodicalIF\":3.8000,\"publicationDate\":\"2025-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vacuum\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0042207X25005299\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25005299","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Study on growth mechanism of InAs array nanowires on two different patterned substrates
Si/SiO2 patterned substrates are usually employed to assist the positioning growth of array nanowires, but the detailed growth mechanism has not been thoroughly investigated. In this work, two completely different methods were adopted to fabricate Si/SiO2 patterned substrates, and the InAs array nanowires grown on them via MOCVD presented some distinct growth results. By deeply analyzing the different processes and structures of the two methods for preparing patterned substrates, the different growth mechanisms of the two array nanowires were studied. Moreover, the method of preparing Si/SiO2 patterned substrates using Si3N4 as a transition layer can further reduce the diameter of naonholes and solve the problem that the diameter of nanoholes of the Si/SiO2 patterned substrates prepared by the traditional method is difficult to be further reduced.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.