双射频等离子体增强脉冲激光沉积中二氧化钛薄膜的裁剪

IF 6.9 2区材料科学 Q2 CHEMISTRY, PHYSICAL

Applied Surface Science Pub Date : 2025-06-20 DOI:10.1016/j.apsusc.2025.163872

Rodrigo Villegas, Matías Tomlinson, Valentina Ureta De La Fuente, Camilo Carrasco, Maximiliano Miranda, José Ignacio Fernández, Daniel Saavedra, María José Retamal, María José Inestrosa-Izurieta, Dinesh Pratap Singh, Felipe A. Angel, Ulrich G. Volkmann, Yayoi Takamura, Heman Bhuyan

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引用次数: 0

摘要

人们一直在寻求高效、经济的光伏材料制造方法，而TiO2等金属氧化物在这一领域发挥着关键作用。在这项研究中，使用双射频（RF）等离子体增强脉冲激光沉积（PLD）系统在玻璃衬底上生长TiO2薄膜，热收支保持在400 °C以下。研究了沉积薄膜的物理、化学和光学性能与低、高射频功率以及沉积时间的关系。这些参数影响了锐钛矿和金红石相的比例、结晶度、氧空位浓度和带隙能。这些发现证明了双射频等离子体增强PLD用于TiO2薄膜的精确调制的实用性，在光伏和光催化方面提供了有前途的应用

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition

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Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition

Efficient and cost-effective methods to create photovoltaic materials are constantly being sought, with metal oxides like TiO₂ playing a key role in this field. In this study, TiO₂ thin films were grown on glass substrates using a dual radiofrequency (RF) plasma-enhanced pulsed laser deposition (PLD) system with a thermal budget that remained below 400 °C. The physical, chemical, and optical properties of the deposited thin films were studied as a function of low- and high-RF powers as well as deposition time. These parameters were found to impact the proportion of anatase and rutile phase and their crystallinity, as well as the oxygen vacancy concentration and band gap energy. These findings demonstrated the utility of dual RF plasma-enhanced PLD for precise modulation of TiO₂ thin-films, offering promising applications in photovoltaics and photocatalysis

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来源期刊

Applied Surface Science 工程技术-材料科学：膜

CiteScore

12.50

自引率

7.50%

发文量

3393

审稿时长

67 days

期刊介绍： Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.