{"title":"V浓度对Ti1-xVxN薄膜x射线吸收边、光力学和抗腐蚀性能的影响","authors":"Sanketa Jena , Mukul Gupta , Bibhu P. Swain","doi":"10.1016/j.vacuum.2025.114496","DOIUrl":null,"url":null,"abstract":"<div><div>Ti<sub>1-x</sub>V<sub>x</sub>N thin films (∼150 nm) were synthesised via DC magnetron sputtering at room temperature for potential hard-coating and electrochemical applications. Increasing vanadium concentration led to a phonon confinement effect, evidenced by a blue shift in Raman modes. Elemental analysis via EDX and XPS showed Ti and V concentrations ranging from 7.42 to 47.37 at.% and 13.77–45.13 at.%, respectively, with near-constant nitrogen content. Ti L-edge XAS confirmed bond weakening (Ti–O, Ti–N, and Ti–V) due to oxygen vacancies, contributing to reduced hardness in high-V content. The highest hardness (15.14 GPa) and elastic modulus (161.11 GPa) were achieved in Ti<sub>0</sub>.<sub>75</sub>V<sub>0</sub>.<sub>25</sub>N and Ti<sub>0</sub>.<sub>5</sub>V<sub>0</sub>.<sub>5</sub>N films, respectively. Electrochemical measurements revealed that Ti<sub>0</sub>.<sub>5</sub>V<sub>0</sub>.<sub>5</sub>N exhibited the best performance, with a specific capacitance of 24.29 mF/cm<sup>2</sup> and a low electrode resistance of 93.13 Ω, indicating superior ion transport. VN films showed the lowest charge transfer resistance (0.61 Ω), reflecting high conductivity. Corrosion analysis showed a progressive increase in corrosion rate from 0.0002 to 0.0153 mm/year with increasing V content, indicating that while V enhances conductivity and capacitance, while compromises corrosion resistance. These findings establish an optimal V concentration window for balancing mechanical integrity, electrochemical performance, and corrosion resistance in Ti<sub>1-x</sub>V<sub>x</sub>N coatings.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114496"},"PeriodicalIF":3.8000,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of V concentration on X-ray absorption edge, opto-mechanical, and anti-corrosion properties of Ti1-xVxN thin films\",\"authors\":\"Sanketa Jena , Mukul Gupta , Bibhu P. Swain\",\"doi\":\"10.1016/j.vacuum.2025.114496\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Ti<sub>1-x</sub>V<sub>x</sub>N thin films (∼150 nm) were synthesised via DC magnetron sputtering at room temperature for potential hard-coating and electrochemical applications. Increasing vanadium concentration led to a phonon confinement effect, evidenced by a blue shift in Raman modes. Elemental analysis via EDX and XPS showed Ti and V concentrations ranging from 7.42 to 47.37 at.% and 13.77–45.13 at.%, respectively, with near-constant nitrogen content. Ti L-edge XAS confirmed bond weakening (Ti–O, Ti–N, and Ti–V) due to oxygen vacancies, contributing to reduced hardness in high-V content. The highest hardness (15.14 GPa) and elastic modulus (161.11 GPa) were achieved in Ti<sub>0</sub>.<sub>75</sub>V<sub>0</sub>.<sub>25</sub>N and Ti<sub>0</sub>.<sub>5</sub>V<sub>0</sub>.<sub>5</sub>N films, respectively. Electrochemical measurements revealed that Ti<sub>0</sub>.<sub>5</sub>V<sub>0</sub>.<sub>5</sub>N exhibited the best performance, with a specific capacitance of 24.29 mF/cm<sup>2</sup> and a low electrode resistance of 93.13 Ω, indicating superior ion transport. VN films showed the lowest charge transfer resistance (0.61 Ω), reflecting high conductivity. Corrosion analysis showed a progressive increase in corrosion rate from 0.0002 to 0.0153 mm/year with increasing V content, indicating that while V enhances conductivity and capacitance, while compromises corrosion resistance. These findings establish an optimal V concentration window for balancing mechanical integrity, electrochemical performance, and corrosion resistance in Ti<sub>1-x</sub>V<sub>x</sub>N coatings.</div></div>\",\"PeriodicalId\":23559,\"journal\":{\"name\":\"Vacuum\",\"volume\":\"240 \",\"pages\":\"Article 114496\"},\"PeriodicalIF\":3.8000,\"publicationDate\":\"2025-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vacuum\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0042207X25004865\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25004865","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Effect of V concentration on X-ray absorption edge, opto-mechanical, and anti-corrosion properties of Ti1-xVxN thin films
Ti1-xVxN thin films (∼150 nm) were synthesised via DC magnetron sputtering at room temperature for potential hard-coating and electrochemical applications. Increasing vanadium concentration led to a phonon confinement effect, evidenced by a blue shift in Raman modes. Elemental analysis via EDX and XPS showed Ti and V concentrations ranging from 7.42 to 47.37 at.% and 13.77–45.13 at.%, respectively, with near-constant nitrogen content. Ti L-edge XAS confirmed bond weakening (Ti–O, Ti–N, and Ti–V) due to oxygen vacancies, contributing to reduced hardness in high-V content. The highest hardness (15.14 GPa) and elastic modulus (161.11 GPa) were achieved in Ti0.75V0.25N and Ti0.5V0.5N films, respectively. Electrochemical measurements revealed that Ti0.5V0.5N exhibited the best performance, with a specific capacitance of 24.29 mF/cm2 and a low electrode resistance of 93.13 Ω, indicating superior ion transport. VN films showed the lowest charge transfer resistance (0.61 Ω), reflecting high conductivity. Corrosion analysis showed a progressive increase in corrosion rate from 0.0002 to 0.0153 mm/year with increasing V content, indicating that while V enhances conductivity and capacitance, while compromises corrosion resistance. These findings establish an optimal V concentration window for balancing mechanical integrity, electrochemical performance, and corrosion resistance in Ti1-xVxN coatings.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.