单硫系InSe/GaS异质结构二维场效应晶体管的调制掺杂和减小磁滞

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Julian Ignacio Deagueros*, Min Gao, Alice Cai, Xiaotong Li, Rajesh Kumar Ulaganathan, Shankar Mani, Raman Sankar, Hatsuo Ishida and Xuan P. A. Gao*, 
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引用次数: 0

摘要

由二维材料制成的异质结构导致了许多新的电子相的发现,并且具有更好性能的电子器件的潜力。然而,电荷在这些由原子薄半导体制成的新型异质结构器件中转移或分布的机制尚未完全了解。通过创建和电子表征具有不同金属触点配置的InSe/GaS异质结构场效应晶体管,我们观察到当InSe和GaS层与金属触点接触时,最大导通电流减小,磁滞增加。结合与时间相关的电导衰减测量,表明从金属触点流入气体的电荷是迟滞的来源,可以通过用InSe封装气体来减轻迟滞。我们得到的几乎无迟滞的器件在室温下表现出34±8 cm2V-1s-1的平均场效应迁移率,与相同尺寸的裸InSe相当,平均n型调制掺杂为~ 1 × 1012 cm-2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Modulation Doping and Reduced Hysteresis in Monochalcogenide InSe/GaS Heterostructure 2D Field-Effect Transistors

Modulation Doping and Reduced Hysteresis in Monochalcogenide InSe/GaS Heterostructure 2D Field-Effect Transistors

Heterostructures made from 2D materials have led to the discovery of many new electronic phases and have the potential for electronic devices with better performance. However, the mechanism by which charge is transferred or distributed in these novel heterostructure devices made of atomically thin semiconductors is yet to be fully understood. By creating and electronically characterizing InSe/GaS heterostructure field-effect transistors with different metal contact configurations, we observed a decrease in the maximum on-current and an increase in the hysteresis when both the InSe and GaS layers are in contact with the metal contacts. This, combined with the time-dependent conductance decay measurements, suggests that charge flow into the GaS from the metal contacts is the source of the hysteresis, which can be mitigated by encapsulating the GaS with InSe. Our resultant nearly hysteresis-free devices exhibit an average field-effect mobility of 34 ± 8 cm2V–1s–1 at room temperature, comparable to that of bare InSe of the same size, with an average n-type modulation doping of ∼ 1 × 1012 cm–2 from the GaS layer.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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