Valdemar Stankevič, Karolis Ratautas, Deividas Andriukaitis, Tadas Kildušis, Oliver Rohm
{"title":"任何表面上的电子器件","authors":"Valdemar Stankevič, Karolis Ratautas, Deividas Andriukaitis, Tadas Kildušis, Oliver Rohm","doi":"10.1002/phvs.202500014","DOIUrl":null,"url":null,"abstract":"<p>A constant challenge in the electronics and semiconductor industry is the ability to create micron-scale electrical traces. While photolithography has long been the standard approach, it comes with complexity and cost. Additive methods like inkjet printing are gaining traction due to their digital and flexible nature, but are currently limited to prototyping or small-scale use because of their slower process speeds. There is a clear need for a technology that combines high resolution and throughput with lower cost and process simplicity, one that can be offered by the SSAIL method.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"22 2","pages":"26-29"},"PeriodicalIF":0.0000,"publicationDate":"2025-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202500014","citationCount":"0","resultStr":"{\"title\":\"Electronics on any surface\",\"authors\":\"Valdemar Stankevič, Karolis Ratautas, Deividas Andriukaitis, Tadas Kildušis, Oliver Rohm\",\"doi\":\"10.1002/phvs.202500014\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>A constant challenge in the electronics and semiconductor industry is the ability to create micron-scale electrical traces. While photolithography has long been the standard approach, it comes with complexity and cost. Additive methods like inkjet printing are gaining traction due to their digital and flexible nature, but are currently limited to prototyping or small-scale use because of their slower process speeds. There is a clear need for a technology that combines high resolution and throughput with lower cost and process simplicity, one that can be offered by the SSAIL method.</p>\",\"PeriodicalId\":101021,\"journal\":{\"name\":\"PhotonicsViews\",\"volume\":\"22 2\",\"pages\":\"26-29\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2025-06-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202500014\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"PhotonicsViews\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/phvs.202500014\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"PhotonicsViews","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/phvs.202500014","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A constant challenge in the electronics and semiconductor industry is the ability to create micron-scale electrical traces. While photolithography has long been the standard approach, it comes with complexity and cost. Additive methods like inkjet printing are gaining traction due to their digital and flexible nature, but are currently limited to prototyping or small-scale use because of their slower process speeds. There is a clear need for a technology that combines high resolution and throughput with lower cost and process simplicity, one that can be offered by the SSAIL method.