通过数值模拟优化SiC单晶生长:石墨环和石墨块设计增强质量传递

IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY
Chao Zhou , Zhengxuan Lu , Chen Li , Yuanhao Lu , Haochao Li , Lei Dong , Shanming Ke , Shuk-Yin Tong
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引用次数: 0

摘要

碳化硅单晶作为大功率和高温半导体器件的关键材料,在其制备过程中一直面临着平衡生长速度和晶体质量的重大挑战。本研究采用STR虚拟反应堆仿真环境中的有限元分析,考察通过引入石墨环和石墨块优化坩埚内部结构对质量输运和晶体质量的影响。仿真结果表明,石墨环可以有效抑制SiC原料粉表面的再结晶现象,优化气相输运路径,从而减少碳夹杂物和缺陷的形成。尽管石墨环略微降低了生长速率,但圆柱形石墨块的加入通过增强热通量来补偿这种降低,从而加速了生长过程。这两种结构设计的结合应用,在保持生长速率的同时,有效地优化了质量输运,为坩埚设计优化提供了新的见解,为大规模生产高质量SiC单晶提供了新的技术途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimization of SiC single crystal growth via numerical simulation: Enhanced mass transport with graphite ring and block design
The silicon carbide (SiC) single crystal, serving as a critical material for high-power and high-temperature semiconductor devices, has consistently encountered the significant challenge of balancing growth rate with crystal quality during its fabrication process. This study employs finite element analysis within the STR Virtual Reactor simulation environment to examine the impact of optimizing the crucible’s internal structure through the introduction of a graphite ring and graphite blocks on mass transport and crystal quality. Simulation results demonstrate that the graphite ring can effectively suppress the recrystallization phenomenon on the surface of SiC raw powders, optimize gas-phase transport pathways, and consequently reduce the formation of carbon inclusions and defects. Although the graphite ring slightly decreases the growth rate, the incorporation of a cylindrical graphite block compensates for this reduction by enhancing thermal flux and thereby accelerating the growth process. The combined application of these two structural designs effectively optimizes mass transport while maintaining the growth rate, offering new insights into crucible design optimization and providing a novel technical approach for the large-scale production of high-quality SiC single crystals.
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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