{"title":"用于神经形态计算的亚量子半金属铋和氧空位灯丝忆阻器","authors":"Chenyu Zhuge, Jiandong Jiang, Liang Chen, Zhichao Xie, Guangyue Shen, Yujun Fu, Qi Wang* and Deyan He, ","doi":"10.1021/acsami.5c0295510.1021/acsami.5c02955","DOIUrl":null,"url":null,"abstract":"<p >Memristors, as neural synapse devices, have been regarded as excellent candidates for non-von Neumann architecture because of their high scalability. However, the randomness of the filaments of state-of-the-art filamentary memristors leads to high variability and poor reliability. Herein, a semimetal bismuth (Bi)-based memristor with oxygen vacancy (V<sub>O</sub>)–Bi filaments was proposed. The Bi-based memristor has a subquantum conductance change, high switching consistency, and controllable weight update linearity. Through spherical aberration-corrected scanning transmission electron microscopy (AC-STEM) and density functional theory (DFT) calculations, the formation mechanism of V<sub>O</sub> and Bi clusters in the filaments and the overall switching mechanism of the V<sub>O</sub>–Bi filaments were elucidated. Specifically, V<sub>O</sub> provides a conductive path while Bi ions migrate, leading to the reduction of Bi clusters in the SiO<sub>2</sub> layer. Furthermore, artificial neural network (ANN) simulations based on back-propagation and reservoir computing (RC) systems achieved large digit recognition accuracies of 95.77 and 94.15%, respectively.</p>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 23","pages":"34129–34138 34129–34138"},"PeriodicalIF":8.2000,"publicationDate":"2025-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Subquantum Semimetal Bi and Oxygen Vacancy Filament Memristors for Neuromorphic Computing\",\"authors\":\"Chenyu Zhuge, Jiandong Jiang, Liang Chen, Zhichao Xie, Guangyue Shen, Yujun Fu, Qi Wang* and Deyan He, \",\"doi\":\"10.1021/acsami.5c0295510.1021/acsami.5c02955\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >Memristors, as neural synapse devices, have been regarded as excellent candidates for non-von Neumann architecture because of their high scalability. However, the randomness of the filaments of state-of-the-art filamentary memristors leads to high variability and poor reliability. Herein, a semimetal bismuth (Bi)-based memristor with oxygen vacancy (V<sub>O</sub>)–Bi filaments was proposed. The Bi-based memristor has a subquantum conductance change, high switching consistency, and controllable weight update linearity. Through spherical aberration-corrected scanning transmission electron microscopy (AC-STEM) and density functional theory (DFT) calculations, the formation mechanism of V<sub>O</sub> and Bi clusters in the filaments and the overall switching mechanism of the V<sub>O</sub>–Bi filaments were elucidated. Specifically, V<sub>O</sub> provides a conductive path while Bi ions migrate, leading to the reduction of Bi clusters in the SiO<sub>2</sub> layer. Furthermore, artificial neural network (ANN) simulations based on back-propagation and reservoir computing (RC) systems achieved large digit recognition accuracies of 95.77 and 94.15%, respectively.</p>\",\"PeriodicalId\":5,\"journal\":{\"name\":\"ACS Applied Materials & Interfaces\",\"volume\":\"17 23\",\"pages\":\"34129–34138 34129–34138\"},\"PeriodicalIF\":8.2000,\"publicationDate\":\"2025-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Materials & Interfaces\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://pubs.acs.org/doi/10.1021/acsami.5c02955\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsami.5c02955","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Subquantum Semimetal Bi and Oxygen Vacancy Filament Memristors for Neuromorphic Computing
Memristors, as neural synapse devices, have been regarded as excellent candidates for non-von Neumann architecture because of their high scalability. However, the randomness of the filaments of state-of-the-art filamentary memristors leads to high variability and poor reliability. Herein, a semimetal bismuth (Bi)-based memristor with oxygen vacancy (VO)–Bi filaments was proposed. The Bi-based memristor has a subquantum conductance change, high switching consistency, and controllable weight update linearity. Through spherical aberration-corrected scanning transmission electron microscopy (AC-STEM) and density functional theory (DFT) calculations, the formation mechanism of VO and Bi clusters in the filaments and the overall switching mechanism of the VO–Bi filaments were elucidated. Specifically, VO provides a conductive path while Bi ions migrate, leading to the reduction of Bi clusters in the SiO2 layer. Furthermore, artificial neural network (ANN) simulations based on back-propagation and reservoir computing (RC) systems achieved large digit recognition accuracies of 95.77 and 94.15%, respectively.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.